Title:
PLASMA PROCESSING DEVICE
Document Type and Number:
WIPO Patent Application WO/2019/004185
Kind Code:
A1
Abstract:
A plasma processing device, comprising: a balun that has a first unbalanced terminal, a second unbalanced terminal, a first balanced terminal, and a second balanced terminal; a grounded vacuum container; a first electrode that is electrically connected to the first balanced terminal; a second electrode that is electrically connected to the second balanced terminal; an adjustment reactance that imparts an effect on the relationship of a first voltage applied to the first electrode and a second voltage applied to the second electrode; a substrate-holding unit that holds a substrate; and a drive mechanism that causes the substrate-holding unit to rotate.
Inventors:
TANABE MASAHARU (JP)
SEKIYA KAZUNARI (JP)
INOUE TADASHI (JP)
SASAMOTO HIROSHI (JP)
SATO TATSUNORI (JP)
TSUCHIYA NOBUAKI (JP)
TAKEDA ATSUSHI (JP)
SEKIYA KAZUNARI (JP)
INOUE TADASHI (JP)
SASAMOTO HIROSHI (JP)
SATO TATSUNORI (JP)
TSUCHIYA NOBUAKI (JP)
TAKEDA ATSUSHI (JP)
Application Number:
PCT/JP2018/024147
Publication Date:
January 03, 2019
Filing Date:
June 26, 2018
Export Citation:
Assignee:
CANON ANELVA CORP (JP)
International Classes:
H05H1/46; B01J19/08; C23C14/34; C23C14/40; H01L21/203; H01L21/3065
Foreign References:
| JPH02156080A | 1990-06-15 | |||
| JP2012174682A | 2012-09-10 | |||
| JPS53141937U | 1978-11-09 | |||
| JP2009302566A | 2009-12-24 |
Attorney, Agent or Firm:
OHTSUKA, Yasunori et al. (JP)
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