Title:
PLASMA PROCESSING DEVICE
Document Type and Number:
WIPO Patent Application WO/2019/107540
Kind Code:
A1
Abstract:
The present invention cools an antenna conductor to stably generate plasma and, while cooling a variable capacitor connected to the antenna conductor, suppresses unexpected fluctuation of the electrostatic capacitance of the variable capacitor. This plasma processing device generates plasma in a vacuum container and processes a substrate by using the plasma, and comprises: the antenna conductor through which a high-frequency current is caused to flow to generates plasma; and the variable capacitor which is electrically connected to the antenna conductor. The antenna conductor has a flow path in which a coolant flows. A dielectric of the variable capacitor is constituted of the coolant flowing through the antenna conductor.
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Inventors:
ANDO YASUNORI (JP)
Application Number:
PCT/JP2018/044161
Publication Date:
June 06, 2019
Filing Date:
November 30, 2018
Export Citation:
Assignee:
NISSIN ELECTRIC CO LTD (JP)
International Classes:
H05H1/46; C23C16/509; H01L21/3065; H01L21/31
Foreign References:
| JP2017004602A | 2017-01-05 | |||
| JP2017033788A | 2017-02-09 | |||
| JP2002541336A | 2002-12-03 | |||
| JP2001060581A | 2001-03-06 | |||
| JPH11162696A | 1999-06-18 |
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