Title:
PLASMA PROCESSING DEVICE
Document Type and Number:
WIPO Patent Application WO/2020/095504
Kind Code:
A1
Abstract:
A plasma processing device (100) is provided with a stage, a first plasma generating unit (101), a drive unit (150), and a control unit (160), and is further provided with a second plasma generating unit (102) spaced apart from the first plasma generating unit (101). The control unit (160) includes a storage unit (169) for storing position distribution data, and a computation processing unit (163) which, on the basis of the position distribution data, computes a ratio of a first operating amount of the first plasma generating unit (101) to a second operating amount of the second plasma generating unit (102), and a scanning amount of the drive unit (150). The control unit (160) is configured to control the first plasma generating unit (101), the second plasma generating unit (102), and the drive unit (150) on the basis of the result of computation by the computation processing unit (163).
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Inventors:
OIDA HIROKAZU (JP)
Application Number:
PCT/JP2019/031927
Publication Date:
May 14, 2020
Filing Date:
August 14, 2019
Export Citation:
Assignee:
MURATA MANUFACTURING CO (JP)
International Classes:
H01L21/3065; H05H1/30
Foreign References:
| JP2004311983A | 2004-11-04 | |||
| JP2009253234A | 2009-10-29 | |||
| JP2006252819A | 2006-09-21 | |||
| JP2014094863A | 2014-05-22 |
Attorney, Agent or Firm:
INABA, Yoshiyuki et al. (JP)
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