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Patent Searching and Data


Title:
PLASMA-RESISTANT RESIN COMPOSITION AND ELECTROSTATIC CHUCKING DEVICE EMPLOYING SAME
Document Type and Number:
WIPO Patent Application WO/2019/107271
Kind Code:
A1
Abstract:
[Problem] To provide: a resin composition in which plasma resistance is considerably enhanced regardless of the type of a matrix resin; and an electrostatic chucking device employing the same. [Solution] The present invention provides: a resin composition that is used in an environment in which said resin composition is directly or indirectly exposed to plasma and that is characterized by comprising a resin, which serves as a matrix, and a filler comprising a layer-like inorganic compound that is dispersed in the resin, which serves as the matrix, and that possesses ion exchanging property, wherein the resin and the layer-like inorganic compound are blended at 1-90% by volume; and an electrostatic chucking device employing said resin composition.

Inventors:
OKUMURA, Katsuya (The Parkhouse Yotsuya wakaba 103 1-22-1, Wakaba, Shinjuku-k, Tokyo 11, 〒1600011, JP)
TSUDA, Hajime (3-1, Mochimunetomoe-cho, Suruga-ku, Shizuoka-sh, Shizuoka 92, 〒4210192, JP)
SHIMIZU, Yuki (3-1, Mochimunetomoe-cho, Suruga-ku, Shizuoka-sh, Shizuoka 92, 〒4210192, JP)
Application Number:
JP2018/043187
Publication Date:
June 06, 2019
Filing Date:
November 22, 2018
Export Citation:
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Assignee:
TOMOEGAWA CO.,LTD. (2-1-3, Kyobashi Chuo-k, Tokyo 35, 〒1048335, JP)
International Classes:
C08L101/00; C08K3/00; C08L83/04; C09J11/04; C09J183/04; C09J201/00; C09K3/10; H01L21/3065
Foreign References:
JPH0725140A1995-01-27
JPH0227748A1990-01-30
JP2013513697A2013-04-22
Attorney, Agent or Firm:
ITOH, Atsushi (Togeki Building 4F, 4-1-1 Tsukiji Chuo-k, Tokyo 45, 〒1040045, JP)
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