Title:
PLASMA SOURCE FOR ROTATING SUSCEPTOR
Document Type and Number:
WIPO Patent Application WO/2018/213272
Kind Code:
A3
Abstract:
Plasma source assemblies comprising an RF hot electrode having a body and at least one return electrode spaced from the RF hot electrode to provide a gap in which a plasma can be formed. An RF feed is connected to the RF hot electrode at a distance from the inner peripheral end of the RF hot electrode that is less than or equal to about 25% of the length of the RF hot electrode.
Inventors:
BERA KALLOL (US)
SUBRAMANI ANANTHA K (US)
FORSTER JOHN C (US)
KRAUS PHILIP A (US)
HOUSHMAND FARZAD (US)
CHEN HANHONG (US)
SUBRAMANI ANANTHA K (US)
FORSTER JOHN C (US)
KRAUS PHILIP A (US)
HOUSHMAND FARZAD (US)
CHEN HANHONG (US)
Application Number:
PCT/US2018/032710
Publication Date:
January 03, 2019
Filing Date:
May 15, 2018
Export Citation:
Assignee:
APPLIED MATERIALS INC (US)
International Classes:
H01L21/687; H01J37/32
Foreign References:
| JP2003338399A | 2003-11-28 | |||
| US20150262792A1 | 2015-09-17 | |||
| US20150200076A1 | 2015-07-16 | |||
| US6084198A | 2000-07-04 | |||
| JP2009105030A | 2009-05-14 |
Attorney, Agent or Firm:
BLANKMAN, Jeffrey I. (US)
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