Title:
PLASMA-TREATMENT APPARATUS AND PLASMA-TREATMENT METHOD
Document Type and Number:
WIPO Patent Application WO/2011/114677
Kind Code:
A1
Abstract:
A substrate (2) stored in a tray (3) is conveyed in a dry-etching system (1). A temporary holding stage (35) is disposed at intervals above a rotating stage (33) that implements an alignment process on the tray (3) before conveyance into a plasma-treatment unit (11). The tray (3) is set on the temporary holding stage (35) and cooled after dry-etching. While dry etching is being implemented at the plasma-treatment unit (11) on one tray (3), conveyance of the rotating stage (33) from a cassette (24) at another tray (3), an alignment process continuing thereafter, and recovery of the tray (3) to the cassette (24) from the temporary holding stage (35) are implemented.
Inventors:
OKITA, Shogo (())
置田 尚吾 (())
WADA, Toshihiro (())
和田 年弘 (())
置田 尚吾 (())
WADA, Toshihiro (())
和田 年弘 (())
Application Number:
JP2011/001442
Publication Date:
September 22, 2011
Filing Date:
March 11, 2011
Export Citation:
Assignee:
PANASONIC CORPORATION (1006, Oaza Kadoma Kadoma-sh, Osaka 01, 〒5718501, JP)
パナソニック株式会社 (〒01 大阪府門真市大字門真１００６番地 Osaka, 〒5718501, JP)
OKITA, Shogo (())
置田 尚吾 (())
WADA, Toshihiro (())
パナソニック株式会社 (〒01 大阪府門真市大字門真１００６番地 Osaka, 〒5718501, JP)
OKITA, Shogo (())
置田 尚吾 (())
WADA, Toshihiro (())
International Classes:
H01L21/677; B65G49/07; H01L21/3065; H01L21/205
Attorney, Agent or Firm:
TANAKA, Mitsuo et al. (AOYAMA & PARTNERS, IMP Building 3-7, Shiromi 1-chome, Chuo-ku, Osaka-sh, Osaka 01, 〒5400001, JP)
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Claims:
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