Title:
PLASMA-TREATMENT APPARATUS AND PLASMA-TREATMENT METHOD
Document Type and Number:
WIPO Patent Application WO/2011/114677
Kind Code:
A1
Abstract:
A substrate (2) stored in a tray (3) is conveyed in a dry-etching system (1). A temporary holding stage (35) is disposed at intervals above a rotating stage (33) that implements an alignment process on the tray (3) before conveyance into a plasma-treatment unit (11). The tray (3) is set on the temporary holding stage (35) and cooled after dry-etching. While dry etching is being implemented at the plasma-treatment unit (11) on one tray (3), conveyance of the rotating stage (33) from a cassette (24) at another tray (3), an alignment process continuing thereafter, and recovery of the tray (3) to the cassette (24) from the temporary holding stage (35) are implemented.
Inventors:
OKITA SHOGO
WADA TOSHIHIRO
MIYAKE SUMIO
KANOU HIDEO
WADA TOSHIHIRO
MIYAKE SUMIO
KANOU HIDEO
Application Number:
PCT/JP2011/001442
Publication Date:
September 22, 2011
Filing Date:
March 11, 2011
Export Citation:
Assignee:
PANASONIC CORP (JP)
OKITA SHOGO
WADA TOSHIHIRO
MIYAKE SUMIO
KANOU HIDEO
OKITA SHOGO
WADA TOSHIHIRO
MIYAKE SUMIO
KANOU HIDEO
International Classes:
H01L21/677; B65G49/07; H01L21/3065; H01L21/205
Foreign References:
| JPH03155619A | 1991-07-03 | |||
| JP2006005086A | 2006-01-05 | |||
| JP2009177190A | 2009-08-06 | |||
| JPH10189685A | 1998-07-21 | |||
| JPH07254538A | 1995-10-03 | |||
| JPH0857296A | 1996-03-05 |
Attorney, Agent or Firm:
TANAKA, Mitsuo et al. (JP)
Mitsuo Tanaka (JP)
Mitsuo Tanaka (JP)
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Claims:
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