Title:
PLASMA TREATMENT DEVICE, AND OPTICAL MONITOR DEVICE
Document Type and Number:
WIPO Patent Application WO/2012/026117
Kind Code:
A1
Abstract:
[Problem] To carry out high accuracy optical monitoring of the surface of a substrate to be treated inside a treatment vessel using non-coherent monitor light having a wide wavelength range, without affecting the uniformity of the electromagnetic radiation from a planar slot antenna. [Solution] The optical monitor device (100) of the present microwave plasma etching device has: a monitor head (102) located in a position more radially inward than the edge of a semiconductor wafer (W) mounted on a susceptor (12), more radially outward than a coaxial tube (66), and above a cooling jacket plate (72); an optical waveguide (104) for monitoring provided vertically below the monitor head (102), and longitudinally traversing the cover plate (72), a dielectric plate (56), a slot plate (54), and a dielectric window (52); and a monitor main body (108) optically connected to the monitor head (102) via an optical fiber (106).
Inventors:
NOZAWA TOSHIHISA (JP)
SENDA TAKAHIRO (JP)
NISHIMOTO SHINYA (JP)
YAMAGAMI MUNETAKA (JP)
MOYAMA KAZUKI (JP)
SENDA TAKAHIRO (JP)
NISHIMOTO SHINYA (JP)
YAMAGAMI MUNETAKA (JP)
MOYAMA KAZUKI (JP)
Application Number:
PCT/JP2011/004698
Publication Date:
March 01, 2012
Filing Date:
August 24, 2011
Export Citation:
Assignee:
TOKYO ELECTRON LTD (JP)
NOZAWA TOSHIHISA (JP)
SENDA TAKAHIRO (JP)
NISHIMOTO SHINYA (JP)
YAMAGAMI MUNETAKA (JP)
MOYAMA KAZUKI (JP)
NOZAWA TOSHIHISA (JP)
SENDA TAKAHIRO (JP)
NISHIMOTO SHINYA (JP)
YAMAGAMI MUNETAKA (JP)
MOYAMA KAZUKI (JP)
International Classes:
H01L21/3065
Foreign References:
| JP2010034393A | 2010-02-12 | |||
| JP2004518272A | 2004-06-17 | |||
| JP2007067423A | 2007-03-15 | |||
| JP2008251660A | 2008-10-16 |
Attorney, Agent or Firm:
SASAKI, Seikoh (JP)
Kiyotaka Sasaki (JP)
Kiyotaka Sasaki (JP)
Download PDF:
Claims: