Title:
PLASMA TREATMENT DEVICE
Document Type and Number:
WIPO Patent Application WO/2019/004187
Kind Code:
A1
Abstract:
A plasma treatment device, comprising: a balun that has a first unbalanced terminal, a second unbalanced terminal, a first balanced terminal, and a second balanced terminal; a grounded vacuum container; a first electrode that is electrically connected to the first balanced terminal; a second electrode that is electrically connected to the second balanced terminal; an adjustment reactance imparting an effect on the relationship between a first voltage applied to the first electrode and a second voltage applied to the second electrode; and a high-frequency power supply that generates a high frequency supplied to between the first unbalanced terminal and the second unbalanced terminal. With the high-frequency power supply, the frequency of the high frequency can be changed, and the relationship is adjusted by the change in frequency.
Inventors:
TANABE MASAHARU (JP)
SEKIYA KAZUNARI (JP)
INOUE TADASHI (JP)
SASAMOTO HIROSHI (JP)
SATO TATSUNORI (JP)
TSUCHIYA NOBUAKI (JP)
TAKEDA ATSUSHI (JP)
SEKIYA KAZUNARI (JP)
INOUE TADASHI (JP)
SASAMOTO HIROSHI (JP)
SATO TATSUNORI (JP)
TSUCHIYA NOBUAKI (JP)
TAKEDA ATSUSHI (JP)
Application Number:
PCT/JP2018/024149
Publication Date:
January 03, 2019
Filing Date:
June 26, 2018
Export Citation:
Assignee:
CANON ANELVA CORP (JP)
International Classes:
H05H1/46; B01J19/08; C23C14/34; H01L21/3065
Foreign References:
| JPH02156080A | 1990-06-15 | |||
| JP2015115216A | 2015-06-22 | |||
| JPS53141937U | 1978-11-09 | |||
| JP2009302566A | 2009-12-24 |
Attorney, Agent or Firm:
OHTSUKA, Yasunori et al. (JP)
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