PLASMA TREATMENT DEVICE

WIPO Patent Application WO/2022/168313

A1

In order to suppress plasma diffusion and unstable discharge and enable stable treatment, the present invention provides a plasma treatment device comprising a treatment chamber having in the interior thereof a specimen base on which to place a specimen, an evacuating unit that evacuates the interior of the treatment chamber to form a vacuum, a magnetic-field-forming mechanism that forms a magnetic field in the interior of the treatment chamber, and a power supplying unit that supplies high-frequency electric power for generating a plasma in the interior of the treatment chamber that has been evacuated by the evacuating unit and has a magnetic field formed therein by the magnetic field-forming mechanism, wherein the treatment chamber is provided with a blocking part that divides the interior of the treatment chamber into a first region on the side supplied with the high-frequency electric power from the power supplying unit and a second region on the side where the specimen base is provided, the blocking part being provided with a first blocking plate provided on the side facing the first region and having formed therein a first opening, a second blocking plate provided on the side facing the second region and having a second opening at a central portion thereof, and a third blocking plate positioned between the first blocking plate and the second blocking plate.

TAKASAKI KOICHI (JP)
IWASE TAKU (JP)

PCT/JP2021/004592

August 11, 2022

February 08, 2021

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HITACHI HIGH TECH CORP (JP)

H01L21/3065

WO2016190036A1

2016-12-01

JP2007005491A	2007-01-11
JP2018533207A	2018-11-08

POLAIRE I.P.C. (JP)

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