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Patent Searching and Data


Title:
PLASMA-TYPE TREATMENT DEVICE
Document Type and Number:
WIPO Patent Application WO/2019/093375
Kind Code:
A1
Abstract:
A plasma-type treatment device (100) of the present invention is provided with: a plasma generation unit; a nozzle which ejects plasma generated by means of the plasma generation unit and/or an active gas produced due to the plasma; a supply source (70) which supplies the plasma generation unit with a plasma generating gas; an operating unit (9) which, when operated by a user, causes the supply source (70) to supply a certain amount of the plasma generating gas to the plasma generation unit; and a notification unit (80) which issues a notification in the form of remainder information indicating the remaining number of times the plasma generating gas can be supplied from the supply source (70) to the plasma generation unit on the basis of the plasma generating gas remaining in the supply source (70).

Inventors:
NAGAHARA YU (JP)
UEHARA TSUYOSHI (JP)
OSHITA TAKAYA (JP)
TAKIKAWA YOSHISHIGE (JP)
Application Number:
PCT/JP2018/041340
Publication Date:
May 16, 2019
Filing Date:
November 07, 2018
Export Citation:
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Assignee:
SEKISUI CHEMICAL CO LTD (JP)
International Classes:
A61N1/44; A61C1/00; A61C17/00; H05H1/24
Domestic Patent References:
WO2009036015A22009-03-19
WO2016203461A12016-12-22
Foreign References:
JP2017510316A2017-04-13
JPH09117521A1997-05-06
KR101716698B12017-03-15
JP2005224607A2005-08-25
JP2017215732A2017-12-07
JPS5441066B21979-12-06
JP2017050267A2017-03-09
Other References:
See also references of EP 3708222A4
Attorney, Agent or Firm:
NISHIZAWA Kazuyoshi et al. (JP)
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