PLASTIC MOLDED ARTICLE COMPRISING VAPOR DEPOSITION FILM FORMED BY PLASMA CVD METHOD

Title:

PLASTIC MOLDED ARTICLE COMPRISING VAPOR DEPOSITION FILM FORMED BY PLASMA CVD METHOD

Document Type and Number:

WIPO Patent Application WO/2008/013314

Kind Code:

A1

Abstract:

Disclosed is a plastic molded article wherein a vapor deposition film is formed on the surface of a plastic substrate by a plasma CVD method. The vapor deposition film is composed of an organosilicon vapor deposition layer formed on the front surface of a plastic substrate (1) and containing no oxygen, and a silicon oxide vapor deposition layer formed on the organosilicon vapor deposition layer. This plastic molded article has good gas barrier property, while being effectively prevented from generation of odor during film formation. In addition, the plastic molded article has excellent flavor-retaining property.

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Inventors:

YAMADA KOUJI (JP)
IEKI TOSHIHIDE (JP)
AIHARA TAKESHI (JP)

Application Number:

PCT/JP2007/065112

Publication Date:

January 31, 2008

Filing Date:

July 26, 2007

Export Citation:

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Assignee:

TOYO SEIKAN KAISHA LTD (JP)
YAMADA KOUJI (JP)
IEKI TOSHIHIDE (JP)
AIHARA TAKESHI (JP)

International Classes:

B32B9/00; B65D23/02; B65D25/14; C23C16/42

Foreign References:

JP2005256061A	2005-09-22
JP2002274521A	2002-09-25
JP2000255579A	2000-09-19

Other References: