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Title:
PNEUMATIC CONVEYING METHOD FOR SILICON DUST, COLLECTION METHOD, AND TREATMENT METHOD
Document Type and Number:
WIPO Patent Application WO/2017/026255
Kind Code:
A1
Abstract:
According to the present invention, when silicon dust generated while pulverizing polycrystalline silicon is collected, the silicon dust pneumatically conveyed inside a duct is guided from the pulverizing location to a wet-type scrubber, and water is first sprayed onto the silicon dust inside the scrubber to cause the silicon dust to settle inside the water (first step). Thereafter, conveyed air is guided to an air resistance section for forcibly curving the conveyed air, and the silicon dust in the conveyed air is captured in the air resistance section (second step). For example, the air resistance section 15 for forcibly curving the conveyed air is provided in an upper section (near the discharge port) of a silo 10, so that the conveyed air is guided to the air resistance section 15, and residual silicon dust is captured. The amount of silicon dust included in the air that has passed through the air resistance section 15 is less than 0.01 g/m3.

Inventors:
MIYAO SHUICHI (JP)
OKADA JUNICHI (JP)
Application Number:
PCT/JP2016/071676
Publication Date:
February 16, 2017
Filing Date:
July 25, 2016
Export Citation:
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Assignee:
SHINETSU CHEMICAL CO (JP)
International Classes:
B65G53/66; B01D50/00; B65G53/24; B65G53/62; C01B33/02
Foreign References:
JP2013031811A2013-02-14
JP2003315268A2003-11-06
JPS60142130A1985-07-27
Attorney, Agent or Firm:
OHNO, Seiji et al. (JP)
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