Title:
POLISHING AGENT, CONCENTRATED ONE-PACK TYPE POLISHING AGENT, TWO-PACK TYPE POLISHING AGENT AND METHOD FOR POLISHING SUBSTRATE
Document Type and Number:
WIPO Patent Application WO/2011/048889
Kind Code:
A1
Abstract:
Disclosed is a polishing agent which comprises particles of a tetravalent metal hydroxide, a cationized polyvinyl alcohol, at least one kind of saccharide selected from the group consisting of an amino sugar, a derivative of the amino sugar, a polysaccharide having an amino sugar and a derivative of the polysaccharide, and water. Also disclosed is a method for polishing a substrate comprising a step wherein, while pressing a silicon oxide film (1) (a film to be polished), which is formed on a silicon substrate (2), against a polishing pad a polishing plate and supplying the aforesaid polishing agent between the silicon oxide film (1) and the polishing pad, the substrate (2) and the polishing plate are moved relative to each other so as to polish the silicon oxide film (1).
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Inventors:
RYUZAKI Daisuke (Hitachi Ltd., 280, Higashikoigakubo 1-chome, Kokubunji-sh, Tokyo 01, 〒1858601, JP)
龍崎 大介 (〒01 東京都国分寺市東恋ヶ窪一丁目２８０番地 株式会社日立製作所 中央研究所内 Tokyo, 〒1858601, JP)
NARITA Takenori (13-1, Higashi-cho 4-chome, Hitachi-sh, Ibaraki 55, 〒3178555, JP)
成田 武憲 (〒55 茨城県日立市東町四丁目１３番１号 日立化成工業株式会社内 Ibaraki, 〒3178555, JP)
龍崎 大介 (〒01 東京都国分寺市東恋ヶ窪一丁目２８０番地 株式会社日立製作所 中央研究所内 Tokyo, 〒1858601, JP)
NARITA Takenori (13-1, Higashi-cho 4-chome, Hitachi-sh, Ibaraki 55, 〒3178555, JP)
成田 武憲 (〒55 茨城県日立市東町四丁目１３番１号 日立化成工業株式会社内 Ibaraki, 〒3178555, JP)
Application Number:
JP2010/065850
Publication Date:
April 28, 2011
Filing Date:
September 14, 2010
Export Citation:
Assignee:
HITACHI CHEMICAL COMPANY, LTD. (1-1 Nishi-Shinjuku 2-chome, Shinjuku-ku Tokyo, 49, 〒1630449, JP)
日立化成工業株式会社 (〒49 東京都新宿区西新宿二丁目１番１号 Tokyo, 〒1630449, JP)
RYUZAKI Daisuke (Hitachi Ltd., 280, Higashikoigakubo 1-chome, Kokubunji-sh, Tokyo 01, 〒1858601, JP)
龍崎 大介 (〒01 東京都国分寺市東恋ヶ窪一丁目２８０番地 株式会社日立製作所 中央研究所内 Tokyo, 〒1858601, JP)
NARITA Takenori (13-1, Higashi-cho 4-chome, Hitachi-sh, Ibaraki 55, 〒3178555, JP)
日立化成工業株式会社 (〒49 東京都新宿区西新宿二丁目１番１号 Tokyo, 〒1630449, JP)
RYUZAKI Daisuke (Hitachi Ltd., 280, Higashikoigakubo 1-chome, Kokubunji-sh, Tokyo 01, 〒1858601, JP)
龍崎 大介 (〒01 東京都国分寺市東恋ヶ窪一丁目２８０番地 株式会社日立製作所 中央研究所内 Tokyo, 〒1858601, JP)
NARITA Takenori (13-1, Higashi-cho 4-chome, Hitachi-sh, Ibaraki 55, 〒3178555, JP)
International Classes:
H01L21/304; B24B37/04; C09K3/14
Attorney, Agent or Firm:
HASEGAWA Yoshiki et al. (SOEI PATENT AND LAW FIRM, Marunouchi MY PLAZA 9th fl. 1-1, Marunouchi 2-chome, Chiyoda-k, Tokyo 05, 〒1000005, JP)
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