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Title:
POLISHING AGENT RECYCLE PROCESSING SYSTEM AND POLISHING AGENT RECOVERY/REGENERATION METHOD
Document Type and Number:
WIPO Patent Application WO/2019/181498
Kind Code:
A1
Abstract:
The present invention addresses the problem of providing a polishing agent recycle processing system and a polishing agent recovery/regeneration method for efficiently recovering a polishing agent from a used polishing agent slurry and reusing the polishing agent as a regenerated polishing agent slurry. This polishing agent recycle processing system continuously performs a polishing process while controlling the concentration of the constituent components of a polishing agent in a polishing agent slurry used for polishing and the constituent components of an object being polished, and removes the constituent components of the object being polished from the used polishing agent slurry to recover/regenerate the polishing agent. The polishing agent recycle processing system is characterized by: comprising a polishing process step section and a polishing agent slurry recovery step section which has a slurry supply tank that stores the polishing agent used for polishing; and supplying the regenerated polishing agent slurry to the slurry supply tank while controlling the concentration of the constituent components of the polishing agent in the slurry supply tank to be equal to or less than the initial concentration at the time of starting the polishing process step.

Inventors:
TSUKIGATA FUMIKO (JP)
MAEZAWA AKIHIRO (JP)
NANJIYOU TAKASHI (JP)
Application Number:
PCT/JP2019/008807
Publication Date:
September 26, 2019
Filing Date:
March 06, 2019
Export Citation:
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Assignee:
KONICA MINOLTA INC (JP)
International Classes:
B24B57/02; B24B37/00; C09K3/14; H01L21/304
Foreign References:
JP2004306210A2004-11-04
JP2015097997A2015-05-28
JP2011083845A2011-04-28
KR20100040056A2010-04-19
Attorney, Agent or Firm:
KOYO INTERNATIONAL PATENT FIRM (JP)
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