Title:
POLISHING AGENT, STORAGE SOLUTION FOR POLISHING AGENT AND POLISHING METHOD
Document Type and Number:
WIPO Patent Application WO/2016/203586
Kind Code:
A1
Abstract:
A polishing agent for mechanochemically polishing a substrate, which comprises a carbon-based material containing 60-95 atm% of carbon when measured by X-ray photoelectron spectroscopy and an insulating material, and removing at least a part of the carbon-based material, said polishing agent comprising abrasive grains containing silica, an allylamine-based polymer and water, wherein the ratio by mass of the allylamine-based polymer content to the abrasive grain content is 0.002-0.400 and the abrasive grains are positively charged in the polishing agent.
Inventors:
MIZUTANI MAKOTO (JP)
NOMURA SATOYUKI (JP)
SAKURAI HARUAKI (JP)
NISHIYAMA MASAYA (JP)
HANANO MASAYUKI (JP)
NOMURA SATOYUKI (JP)
SAKURAI HARUAKI (JP)
NISHIYAMA MASAYA (JP)
HANANO MASAYUKI (JP)
Application Number:
PCT/JP2015/067508
Publication Date:
December 22, 2016
Filing Date:
June 17, 2015
Export Citation:
Assignee:
HITACHI CHEMICAL CO LTD (JP)
International Classes:
B24B37/00; H01L21/304; B24B37/013; C09K3/14
Domestic Patent References:
| WO2012161202A1 | 2012-11-29 |
Foreign References:
| JP2007144613A | 2007-06-14 | |||
| JP2015021132A | 2015-02-02 | |||
| JP2010056199A | 2010-03-11 | |||
| JP2011060888A | 2011-03-24 | |||
| JP2008541158A | 2008-11-20 | |||
| JP2012142064A | 2012-07-26 |
Attorney, Agent or Firm:
HASEGAWA Yoshiki et al. (JP)
Yoshiki Hasegawa (JP)
Yoshiki Hasegawa (JP)
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