Title:
POLISHING AGENT FOR SYNTHETIC QUARTS GLASS SUBSTRATE, PROCESS FOR PRODUCING SAME, AND METHOD FOR POLISHING SYNTHETIC QUARTS GLASS SUBSTRATE
Document Type and Number:
WIPO Patent Application WO/2017/081835
Kind Code:
A1
Abstract:
The present invention is a polishing agent for synthetic quarts glass substrates which comprises abrasive grains and water, characterized in that the abrasive grains comprise a mixture of wet-process ceria grains and dry-process ceria grains, the mass ratio of the wet-process ceria grains to the dry-process ceria grains being 70/30 to 90/10. Due to this, the polishing agent has a high polishing rate and is highly effective in diminishing the occurrence of defects caused by polishing.
Inventors:
TAKAHASHI MITSUHITO (JP)
NOJIMA YOSHIHIRO (JP)
NOJIMA YOSHIHIRO (JP)
Application Number:
PCT/JP2016/004547
Publication Date:
May 18, 2017
Filing Date:
October 12, 2016
Export Citation:
Assignee:
SHINETSU CHEMICAL CO (JP)
International Classes:
B24B37/00; C09K3/14; C03C19/00
Domestic Patent References:
| WO2012141111A1 | 2012-10-18 |
Foreign References:
| JP2013541609A | 2013-11-14 | |||
| JP2004162062A | 2004-06-10 | |||
| JP2003031529A | 2003-01-31 | |||
| JP2010036290A | 2010-02-18 | |||
| JP2011151405A | 2011-08-04 | |||
| JP2015054967A | 2015-03-23 |
Attorney, Agent or Firm:
YOSHIMIYA, Mikio et al. (JP)
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