Title:
POLISHING AGENT FOR SYNTHETIC QUARTZ GLASS SUBSTRATE, AND METHOD FOR POLISHING SYNTHETIC QUARTZ GLASS SUBSTRATE
Document Type and Number:
WIPO Patent Application WO/2016/181600
Kind Code:
A1
Abstract:
The present invention is a polishing agent for synthetic quartz glass substrates which comprises abrasive grains, a polishing accelerator, and water, characterized in that the abrasive grains are wet-process ceria particles and that the polishing accelerator is any of polyphosphoric acid and salts thereof, metaphosphoric acid and salts thereof, and tungstenic acid and salts thereof. Thus, the polishing agent for synthetic quartz glass substrates not only has a high polishing rate but also can be sufficiently inhibited from developing defects due to polishing.
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Inventors:
TAKAHASHI MITSUHITO (JP)
NOJIMA YOSHIHIRO (JP)
NOJIMA YOSHIHIRO (JP)
Application Number:
PCT/JP2016/001866
Publication Date:
November 17, 2016
Filing Date:
March 31, 2016
Export Citation:
Assignee:
SHINETSU CHEMICAL CO (JP)
International Classes:
C09K3/14; B24B37/00; C09G1/02; G11B5/84
Domestic Patent References:
| WO2013138558A1 | 2013-09-19 | |||
| WO2010098278A1 | 2010-09-02 | |||
| WO2007018376A1 | 2007-02-15 |
Foreign References:
| JP2013541609A | 2013-11-14 | |||
| JP2015054967A | 2015-03-23 | |||
| JP2004162062A | 2004-06-10 | |||
| JP2005336400A | 2005-12-08 | |||
| CN101153205A | 2008-04-02 | |||
| JP2010510157A | 2010-04-02 |
Attorney, Agent or Firm:
YOSHIMIYA, Mikio et al. (JP)
Good Miya Mikio (JP)
Good Miya Mikio (JP)
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