Title:
POLISHING AGENT FOR SYNTHETIC QUARTZ GLASS SUBSTRATE AND POLISHING METHOD FOR SYNTHETIC QUARTZ GLASS SUBSTRATE
Document Type and Number:
WIPO Patent Application WO/2019/097945
Kind Code:
A1
Abstract:
The present invention relates to a polishing agent for a synthetic quartz glass substrate, the polishing agent being characterized by comprising wet ceria particles and non-spherical silica particles, wherein the average primary particle diameter of the wet ceria particles is 30-50 nm, and the average primary particle diameter of the non-spherical silica particles is 80-120 nm. According to the present invention, a polishing agent, which is for a synthetic quartz glass substrate and which has a high polishing rate and can sufficiently reduce the occurrence of defects caused by polishing, is provided.
Inventors:
TAKAHASHI MITSUHITO (JP)
Application Number:
PCT/JP2018/038758
Publication Date:
May 23, 2019
Filing Date:
October 18, 2018
Export Citation:
Assignee:
SHINETSU CHEMICAL CO (JP)
International Classes:
C09K3/14; B24B37/00; C03C19/00
Domestic Patent References:
| WO2017081835A1 | 2017-05-18 |
Foreign References:
| JP2012143845A | 2012-08-02 | |||
| JP2016127139A | 2016-07-11 | |||
| JP2017155242A | 2017-09-07 | |||
| JP2002150548A | 2002-05-24 |
Attorney, Agent or Firm:
YOSHIMIYA Mikio et al. (JP)
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