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Title:
POLISHING COMPOSITION AND POLISHING METHOD
Document Type and Number:
WIPO Patent Application WO/2021/200149
Kind Code:
A1
Abstract:
The present invention provides a polishing composition including fumed silica, an oxidizing agent, and a metal salt. The polishing composition includes more than 10 mmol/L of the metal salt.

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Inventors:
TAKAMI SHINICHIRO (JP)
Application Number:
PCT/JP2021/010796
Publication Date:
October 07, 2021
Filing Date:
March 17, 2021
Export Citation:
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Assignee:
FUJIMI INC (JP)
International Classes:
C09K3/14; B24B37/00; H01L21/304
Foreign References:
JP2001189296A2001-07-10
JP2007520050A2007-07-19
Attorney, Agent or Firm:
ABE, Makoto (JP)
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