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Title:
POLISHING COMPOSITION AND POLISHING COMPOSITION SET
Document Type and Number:
WIPO Patent Application WO/2018/043504
Kind Code:
A1
Abstract:
Provided is a polishing composition which is effective for reducing surface defects. A polishing composition according to the present invention contains abrasive grains, a water-soluble polymer and a basic compound. The water-soluble polymer contains a polymer A that satisfies both of the conditions (1) and (2) described below. (1) Each molecule contains a vinyl alcohol unit and a non-vinyl alcohol unit. (2) The adsorption parameter as calculated by [(C1 - C2)/C1] × 100 is 5 or more. In the formula, C1 represents the total amount of organic carbon contained in test liquid L1 that contains 0.017% by weight of the polymer A and 0.009% by weight of ammonia; and C2 represents the total amount of organic carbon contained in a supernatant which is obtained by subjecting a test liquid L2 that contains 0.46% by weight of a colloidal silica having a BET diameter of 35 nm, 0.017% by weight of the polymer A and 0.009% by weight of ammonia to centrifugal separation, thereby having the abrasive grains settle out.

Inventors:
TSUCHIYA, Kohsuke (1-1 Chiryo 2-chome, Nishibiwajima-cho, Kiyosu-sh, Aichi 02, 〒4528502, JP)
TANSHO, Hisanori (1-1 Chiryo 2-chome, Nishibiwajima-cho, Kiyosu-sh, Aichi 02, 〒4528502, JP)
ICHITSUBO, Taiki (1-1 Chiryo 2-chome, Nishibiwajima-cho, Kiyosu-sh, Aichi 02, 〒4528502, JP)
ASADA, Maki (1-1 Chiryo 2-chome, Nishibiwajima-cho, Kiyosu-sh, Aichi 02, 〒4528502, JP)
Application Number:
JP2017/031008
Publication Date:
March 08, 2018
Filing Date:
August 29, 2017
Export Citation:
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Assignee:
FUJIMI INCORPORATED (1-1 Chiryo 2-chome, Nishibiwajima-cho Kiyosu-sh, Aichi 02, 〒4528502, JP)
TOAGOSEI CO.,LTD. (1-14-1, Nishi-Shimbashi Minato-k, Tokyo 19, 〒1058419, JP)
International Classes:
C09K3/14; B24B37/00; H01L21/304
Domestic Patent References:
WO2014030570A12014-02-27
WO2013137212A12013-09-19
WO2014148399A12014-09-25
Foreign References:
JP2014038906A2014-02-27
JP2014116557A2014-06-26
JP2009147267A2009-07-02
JP2015109423A2015-06-11
JP2016056220A2016-04-21
JP2006186356A2006-07-13
Attorney, Agent or Firm:
ABE, Makoto (Kyodo Patent Law Firm, BPR Place Hisaya-Odori 3-20-3, Marunouchi, Naka-ku, Nagoya-sh, Aichi 02, 〒4600002, JP)
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