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Title:
POLISHING COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2017/187749
Kind Code:
A1
Abstract:
[Problem] To provide a means for improving the dispersibility of abrasive grains while maintaining the polishing performance, and to provide a means for improving the redispersibility of abrasive grains while maintaining the polishing performance. [Solution] A polishing composition which comprises abrasive grains, a phyllosilicate compound, and a dispersion medium.

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Inventors:
TENKOU KYOUSUKE (JP)
Application Number:
PCT/JP2017/006954
Publication Date:
November 02, 2017
Filing Date:
February 23, 2017
Export Citation:
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Assignee:
FUJIMI INC (JP)
International Classes:
B24B37/00; C09K3/14
Foreign References:
JP2011507998A2011-03-10
JP2000017251A2000-01-18
JPS62297062A1987-12-24
JP2008502776A2008-01-31
JPH08209117A1996-08-13
JP2015203080A2015-11-16
Attorney, Agent or Firm:
HATTA & ASSOCIATES (JP)
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