Title:
POLISHING FILM
Document Type and Number:
WIPO Patent Application WO/2012/147312
Kind Code:
A1
Abstract:
The present invention provides a polishing film with which, even when water containing impurity ions is used as a polishing liquid, the abrasive particles comprising SiO2 are less apt to adhere to the polished surface, e.g., the polished surface of an end of an optical fiber itself, and which is less apt to cause the optical loss attributable to scratches or edge chips in the polished surface. The polishing film hence renders good finish-polishing quality possible. This polishing film is characterized by comprising a substrate and an abrasive layer which has been disposed on a surface of the substrate and which comprises abrasive particles comprising SiO2, a binder resin, and an adhesion inhibitor containing a phosphorus compound.
Inventors:
TAURA TOSHIKAZU (JP)
SAITO KAZUO (JP)
MUKAI FUMIHIRO (JP)
SAITO KAZUO (JP)
MUKAI FUMIHIRO (JP)
Application Number:
PCT/JP2012/002703
Publication Date:
November 01, 2012
Filing Date:
April 18, 2012
Export Citation:
Assignee:
BANDO CHEMICAL IND (JP)
TAURA TOSHIKAZU (JP)
SAITO KAZUO (JP)
MUKAI FUMIHIRO (JP)
TAURA TOSHIKAZU (JP)
SAITO KAZUO (JP)
MUKAI FUMIHIRO (JP)
International Classes:
B24D11/00; B24B19/00; B24D3/00
Foreign References:
| JP2003124166A | 2003-04-25 | |||
| JP2005537941A | 2005-12-15 | |||
| JP2010274348A | 2010-12-09 | |||
| JP2001089749A | 2001-04-03 | |||
| JP2004322253A | 2004-11-18 | |||
| JP2005008875A | 2005-01-13 |
Attorney, Agent or Firm:
NAKA, Koichi (JP)
Relations Koichi (JP)
Relations Koichi (JP)
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Claims:
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