Title:
POLISHING FLUID COMPOSITION FOR GLASS HARD DISC SUBSTRATES
Document Type and Number:
WIPO Patent Application WO/2011/136106
Kind Code:
A1
Abstract:
Provided is a polishing fluid composition for glass hard disc substrates which combines a high polish rate and high cleanliness and which, even when used in a fluid-circulating polishing system, can keep a high polish rate for a long time. A polishing fluid composition for glass hard disc substrates which comprises an amine compound, an acid, silica particles, and water, wherein the amine compound is selected from the group consisting of amino alcohols, piperazine, and derivatives thereof and contains two or three nitrogen atoms in the molecule, at least one of the nitrogen atoms being in the form of a primary or secondary amine.
Inventors:
DOI Haruhiko (())
Application Number:
JP2011/059740
Publication Date:
November 03, 2011
Filing Date:
April 20, 2011
Export Citation:
Assignee:
KAO CORPORATION (14-10, Nihonbashi Kayabacho 1-chome Chuo-k, Tokyo 10, 〒1038210, JP)
花王株式会社 (〒10 東京都中央区日本橋茅場町一丁目１４番１０号 Tokyo, 〒1038210, JP)
花王株式会社 (〒10 東京都中央区日本橋茅場町一丁目１４番１０号 Tokyo, 〒1038210, JP)
International Classes:
C09K3/14; B24B37/00; G11B5/84
Attorney, Agent or Firm:
IKEUCHI SATO & PARTNER PATENT ATTORNEYS (26th Floor, OAP TOWER 8-30, Tenmabashi 1-chome, Kita-ku, Osaka-sh, Osaka 26, 〒5306026, JP)
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