Title:
POLISHING LIQUID, METHOD FOR MANUFACTURING GLASS SUBSTRATE, AND METHOD FOR MANUFACTURING MAGNETIC DISK
Document Type and Number:
WIPO Patent Application WO/2019/088209
Kind Code:
A1
Abstract:
According to the present invention, in a particle size distribution for a cerium oxide contained in a polishing liquid as obtained by a laser diffraction/scattering method, D5 is 1 μm or less, and the difference between D95 and D5 is 3 μm or more, assuming that a particle size is Dx[μm], when the cumulative particle volume cumulated from a small particle diameter side reaches x[%] of the total particle volume.
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Inventors:
TAKIZAWA TOSHIO (JP)
Application Number:
PCT/JP2018/040610
Publication Date:
May 09, 2019
Filing Date:
October 31, 2018
Export Citation:
Assignee:
HOYA CORP (JP)
International Classes:
C09K3/14; B24B1/00; B24B9/00; B24B37/00; G11B5/84
Domestic Patent References:
| WO2013069720A1 | 2013-05-16 | |||
| WO2016002825A1 | 2016-01-07 |
Foreign References:
| JP2014197449A | 2014-10-16 | |||
| JP2012020377A | 2012-02-02 | |||
| JP2002371267A | 2002-12-26 | |||
| JP2008284679A | 2008-11-27 | |||
| JP2002301655A | 2002-10-15 | |||
| JP2002180034A | 2002-06-26 |
Attorney, Agent or Firm:
GLOBAL IP TOKYO (JP)
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