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Patent Searching and Data


Title:
POLISHING MATERIAL
Document Type and Number:
WIPO Patent Application WO/2017/119342
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide a polishing material which has excellent polishing rate and is not susceptible to decrease of the polishing rate for a relatively long period of time. The present invention is a polishing material which is provided with: a base sheet; and a polishing layer that is laminated on the front surface of the base sheet and contains abrasive grains and a binder for the abrasive grains. This polishing material is characterized in that: the binder is mainly composed of an inorganic material; the polishing layer has a plurality of projected portions in the surface, said projected portions being divided by grooves; the average area of the projected portions is from 1 mm2 to 300 mm2 (inclusive); and the total area occupancy of the plurality of projected portions relative to the whole area of the polishing layer is from 4% to 15% (inclusive). It is preferable that this polishing material is additionally provided with filler parts which are filled into the grooves and are mainly composed of a resin or an inorganic material, and which do not substantially contain abrasive grains. It is preferable that the ratio of the average thickness of the filler parts to the average thickness of the polishing layer is from 0.1 to 1 (inclusive). It is preferable that the abrasive grains are diamond abrasive grains. It is preferable that the inorganic material is a silicate.

Inventors:
SHIMOYAMA Kenji (6-6, Minatojima-Minamimachi 4-chome, Chuo-ku, Kobe-sh, Hyogo 47, 〒6500047, JP)
SAITO Kazuo (6-6, Minatojima-Minamimachi 4-chome, Chuo-ku, Kobe-sh, Hyogo 47, 〒6500047, JP)
SASASHIMA Keisuke (6-6, Minatojima-Minamimachi 4-chome, Chuo-ku, Kobe-sh, Hyogo 47, 〒6500047, JP)
TAURA Toshikazu (6-6, Minatojima-Minamimachi 4-chome, Chuo-ku, Kobe-sh, Hyogo 47, 〒6500047, JP)
Application Number:
JP2016/088721
Publication Date:
July 13, 2017
Filing Date:
December 26, 2016
Export Citation:
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Assignee:
BANDO CHEMICAL INDUSTRIES, LTD. (6-6 Minatojima-Minamimachi 4-chome, Chuo-ku Kobe-sh, Hyogo 47, 〒6500047, JP)
International Classes:
B24D11/00; B24D3/00; B24D3/14; C09G1/02; C09K3/14
Domestic Patent References:
2015-12-23
2014-01-09
2015-04-02
Foreign References:
JPH03501371A1991-03-28
JP2003527974A2003-09-24
JPH0236074A1990-02-06
Attorney, Agent or Firm:
AMANO Kazunori (6th Floor Fujikogyo-Nishimotomachi Building, 1-18, Aioi-cho 1-chome, Chuo-ku, Kobe-sh, Hyogo 25, 〒6500025, JP)
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