Title:
POLISHING METHOD USING POLISHING BRUSH
Document Type and Number:
WIPO Patent Application WO/2019/215962
Kind Code:
A1
Abstract:
A polishing brush (1) has a plurality of whetstone posts (7) that are arranged in an annular fashion in parallel around an axis line L, and a holder (21) to hold the base ends of the whetstone posts (7). During polishing work in which a workpiece W face (41) to be polished that comprises a convex curved face is polished using the polishing brush (1), the axis line L of the polishing brush (1) is inclined with respect to the normal vector (43) of a section (42) of the face (41) to be polished that is in contact with the whetstone post (7) tips.
Inventors:
OKADA HIROYUKI (JP)
Application Number:
PCT/JP2019/002013
Publication Date:
November 14, 2019
Filing Date:
January 23, 2019
Export Citation:
Assignee:
XEBEC TECH CO LTD (JP)
TAIMEI CHEMICALS CO LTD (JP)
TAIMEI CHEMICALS CO LTD (JP)
International Classes:
B24B29/00; B24D13/14
Domestic Patent References:
| WO2017126011A1 | 2017-07-27 |
Foreign References:
| JP2013220510A | 2013-10-28 | |||
| JP2011036974A | 2011-02-24 | |||
| US20040058629A1 | 2004-03-25 |
Attorney, Agent or Firm:
KAWAI Toru et al. (JP)
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