Title:
POLISHING PAD HAVING A TRICOT MESH FABRIC AS A BASE
Document Type and Number:
WIPO Patent Application WO/2010/041822
Kind Code:
A4
Abstract:
The present invention relates to a polishing pad having a base knitted into a net with meshes for absorbing and discharging dust generated during polishing to an external dust suction device or for storing the dust in a pocket system, thereby improving polishing efficiency. The polishing pad of the present invention is provided with polishing powder firmly bonded onto one side of the base formed into a wide area to improve the durability of the polishing pad. The polishing pad according to one embodiment of the present invention comprises a tricot mesh fabric (10) having plane portions (12) formed by densely knitting fiber yarns into a net and meshes (14) formed between the plane portions (12), a polishing powder layer (20) formed by bonding polishing powder to the plane portions at one side of the tricot mesh fabric (10) with an adhesive, and an upper layer (30) made of Velcro fabric and attached to the other side of the tricot mesh fabric (10). The polishing pad of the present invention is detachably fastened to the male hook Velcro formed at the surface of a polishing pad holder of an electric power tool (sander).
Inventors:
KIM MYUNG MOOK (KR)
Application Number:
PCT/KR2009/005130
Publication Date:
August 19, 2010
Filing Date:
September 10, 2009
Export Citation:
Assignee:
KIM MYUNG MOOK (KR)
International Classes:
B24D3/20
Attorney, Agent or Firm:
YOO, BYUNG SUN (KR)
유병선 (KR)
유병선 (KR)
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