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Title:
POLISHING PAD AND METHOD FOR MANUFACTURING SAME, AND METHOD FOR MANUFACTURING ABRASIVE
Document Type and Number:
WIPO Patent Application WO/2017/209050
Kind Code:
A1
Abstract:
Provided is a polishing pad having a knit fabric configured from a warp and a weft, and a resin with which the knit fabric is impregnated, the polishing pad having a cross-section cut along the direction of the surface of the knit fabric as a polishing surface.

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Inventors:
TOKUSHIGE SHIN (JP)
NAKASE KEISUKE (JP)
KASHIWADA HIROSHI (JP)
YAMADA TATSUYA (JP)
NARADA YOUSUKE (JP)
KOIKE KENICHI (JP)
Application Number:
PCT/JP2017/019916
Publication Date:
December 07, 2017
Filing Date:
May 29, 2017
Export Citation:
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Assignee:
FUJIBO HOLDINGS INC (JP)
International Classes:
B24B37/24; H01L21/304
Foreign References:
JP2013182952A2013-09-12
JP2004358588A2004-12-24
JP2010029996A2010-02-12
JP2010064216A2010-03-25
JP2010201591A2010-09-16
JP2013240839A2013-12-05
JPH058178A1993-01-19
JP2007061961A2007-03-15
JP2001205555A2001-07-31
JP2015221462A2015-12-10
Other References:
See also references of EP 3441185A4
Attorney, Agent or Firm:
INABA, Yoshiyuki et al. (JP)
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