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Title:
POLISHING PAD AND METHOD FOR MANUFACTURING SAME
Document Type and Number:
WIPO Patent Application WO/2018/092630
Kind Code:
A1
Abstract:
The present invention addresses the problem of providing: a polishing pad that is long-lasting, has a high polish rate, and is capable of producing a high degree of flatness on polished articles; and a method for manufacturing the polishing pad. The solution provided is to eliminate a sea component from a non-woven fabric that includes a binder fabric and a sea-island type composite fiber composed of the sea component and an island component, the island component having a diameter of 10-2500 nm, and to add a polymer elastic body to the non-woven fabric.

Inventors:
YAMAUCHI Tateki (2-4 Nakanoshima 3-chome, Kita-k, Osaka-shi Osaka 05, 〒5300005, JP)
KAMIYAMA Mie (2-4, Nakanoshima 3-chome, Kita-ku, Osaka-sh, Osaka 05, 〒5300005, JP)
Application Number:
JP2017/040019
Publication Date:
May 24, 2018
Filing Date:
November 07, 2017
Export Citation:
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Assignee:
TEIJIN FRONTIER CO., LTD. (2-4 Nakanoshima 3-chome, Kita-ku Osaka-sh, Osaka 05, 〒5300005, JP)
International Classes:
B24B37/24; D04H1/4382; D04H1/541; D04H1/542; H01L21/304
Domestic Patent References:
WO2005095686A12005-10-13
WO2008130019A12008-10-30
Foreign References:
JP2010064153A2010-03-25
JP2013237107A2013-11-28
JP2004111940A2004-04-08
JP2008240168A2008-10-09
JP2010188482A2010-09-02
JP2005329534A2005-12-02
JP2005334997A2005-12-08
JP2017177212A2017-10-05
JP2015229219A2015-12-21
JP2010029997A2010-02-12
JP2009154291A2009-07-16
JP2012071415A2012-04-12
JP2015063782A2015-04-09
Attorney, Agent or Firm:
TAMEYAMA Taro (2-1 Kasumigaseki 3-chome, Chiyoda-k, Tokyo 13, 〒1000013, JP)
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