Title:
POLISHING PAD AND METHOD FOR PRODUCING SAME
Document Type and Number:
WIPO Patent Application WO/2012/056513
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide: a polishing pad that improves dressing properties, and with which the surface of an object to be polished is not easily scratched; and a method for producing the polishing pad. This polishing pad has an abrasive layer comprising non-foamed polyurethane. The non-foamed polyurethane is a reaction-hardened body of a polyurethane raw material composition containing: an isocyanate-terminated prepolymer (A) obtained by reacting a prepolymer (A) raw material composition containing a diisocyanate, a high-molecular-weight polyol (a) and a low-molecular-weight polyol; an isocyanate-modified body polymerized by adding at least 3 diisocyanates; an isocyanate-terminated prepolymer (B) obtained by reacting a prepolymer (B) raw material composition containing a high-molecular-weight polyol (b); and a chain extender. The polishing pad is characterized in that the added quantity of the isocyanate-terminated prepolymer (B) is 5 to 30 parts by weight with respect to 100 parts by weight of the isocyanate-terminated prepolymer (A).
Inventors:
NAKAI YOSHIYUKI (JP)
OGAWA KAZUYUKI (JP)
NAKAMURA KENJI (JP)
OGAWA KAZUYUKI (JP)
NAKAMURA KENJI (JP)
Application Number:
PCT/JP2010/068911
Publication Date:
May 03, 2012
Filing Date:
October 26, 2010
Export Citation:
Assignee:
TOYO TIRE & RUBBER CO (JP)
NAKAI YOSHIYUKI (JP)
OGAWA KAZUYUKI (JP)
NAKAMURA KENJI (JP)
NAKAI YOSHIYUKI (JP)
OGAWA KAZUYUKI (JP)
NAKAMURA KENJI (JP)
International Classes:
B24B37/00; B28D5/04; H01L21/304
Foreign References:
| JP2008080478A | 2008-04-10 | |||
| JP2004189820A | 2004-07-08 | |||
| JP2008060360A | 2008-03-13 |
Attorney, Agent or Firm:
UNIUS PATENT ATTORNEYS OFFICE (JP)
Patent business corporation ユニアス international patent firm (JP)
Patent business corporation ユニアス international patent firm (JP)
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