Title:
POLISHING PAD FOR A POLISHING SYSTEM
Document Type and Number:
WIPO Patent Application WO/2012/023818
Kind Code:
A2
Abstract:
The present invention relates to a polishing pad for a system for polishing a glass plate. The polishing pad may be mounted on a polishing plate, and has predetermined flow channel patterns for enabling a polishing liquid supplied from a polishing liquid supply unit to flow along a surface of the glass plate being polished. At least two types of flow channel patterns are provided.
Inventors:
MIN KYOUNG-HOON (KR)
IM YE-HOON (KR)
LEE DAE-YEON (KR)
SONG JAE-IK (KR)
PARK SU-CHAN (KR)
IM YE-HOON (KR)
LEE DAE-YEON (KR)
SONG JAE-IK (KR)
PARK SU-CHAN (KR)
Application Number:
PCT/KR2011/006088
Publication Date:
February 23, 2012
Filing Date:
August 18, 2011
Export Citation:
Assignee:
LG CHEMICAL LTD (KR)
MIN KYOUNG-HOON (KR)
IM YE-HOON (KR)
LEE DAE-YEON (KR)
SONG JAE-IK (KR)
PARK SU-CHAN (KR)
MIN KYOUNG-HOON (KR)
IM YE-HOON (KR)
LEE DAE-YEON (KR)
SONG JAE-IK (KR)
PARK SU-CHAN (KR)
International Classes:
B24D11/00; B24B7/00; B24D7/00
Foreign References:
| KR20090192290A | ||||
| KR20090192292A | ||||
| KR20090192293A | ||||
| KR20100007100A | 2010-01-26 |
Other References:
See also references of EP 2607019A4
Attorney, Agent or Firm:
PHIL & ONZI INT'L PATENT & LAW FIRM (KR)
특허법인 필앤온지 (KR)
특허법인 필앤온지 (KR)
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Claims: