Title:
POLISHING PAD FOR A POLISHING SYSTEM
Document Type and Number:
WIPO Patent Application WO/2012/023818
Kind Code:
A3
Abstract:
The present invention relates to a polishing pad for a system for polishing a glass plate. The polishing pad may be mounted on a polishing plate, and has predetermined flow channel patterns for enabling a polishing liquid supplied from a polishing liquid supply unit to flow along a surface of the glass plate being polished. At least two types of flow channel patterns are provided.
Inventors:
MIN KYOUNG-HOON (KR)
IM YE-HOON (KR)
LEE DAE-YEON (KR)
SONG JAE-IK (KR)
PARK SU-CHAN (KR)
IM YE-HOON (KR)
LEE DAE-YEON (KR)
SONG JAE-IK (KR)
PARK SU-CHAN (KR)
Application Number:
PCT/KR2011/006088
Publication Date:
May 10, 2012
Filing Date:
August 18, 2011
Export Citation:
Assignee:
LG CHEMICAL LTD (KR)
MIN KYOUNG-HOON (KR)
IM YE-HOON (KR)
LEE DAE-YEON (KR)
SONG JAE-IK (KR)
PARK SU-CHAN (KR)
MIN KYOUNG-HOON (KR)
IM YE-HOON (KR)
LEE DAE-YEON (KR)
SONG JAE-IK (KR)
PARK SU-CHAN (KR)
International Classes:
B24D11/00; B24B7/00; B24D7/00
Foreign References:
| KR20080071933A | 2008-08-05 | |||
| US20080090503A1 | 2008-04-17 | |||
| KR20010038440A | 2001-05-15 |
Other References:
See also references of EP 2607019A4
Attorney, Agent or Firm:
PHIL & ONZI INT'L PATENT & LAW FIRM (8F.1536-7, Seocho-dong,Seocho-gu, Seoul 137-872, KR)
Download PDF:
Claims: