Title:
POLISHING PAD
Document Type and Number:
WIPO Patent Application WO/2018/052133
Kind Code:
A1
Abstract:
The present invention is a polishing pad or the like, which comprises a pad main body that is formed of a polymer body containing a polyurethane resin and cerium oxide particles. The pad main body is a part that constitutes a polishing surface; and the cerium oxide particles are contained in the polymer body in the form of primary particles and secondary particles, in each of which a plurality of primary particles aggregate.
Inventors:
AKAJI MASATOSHI (JP)
ITO KAZUNORI (JP)
KITA YOSHIO (JP)
KAWAI NAOKO (JP)
ITO KAZUNORI (JP)
KITA YOSHIO (JP)
KAWAI NAOKO (JP)
Application Number:
PCT/JP2017/033533
Publication Date:
March 22, 2018
Filing Date:
September 15, 2017
Export Citation:
Assignee:
NITTA HAAS INC (JP)
International Classes:
B24B37/24; B24B37/20; B24D3/00; B24D3/32; B24D11/00; C03C19/00
Domestic Patent References:
| WO2000073211A1 | 2000-12-07 |
Foreign References:
| JP2007250166A | 2007-09-27 | |||
| JP2015140402A | 2015-08-03 | |||
| JP2002346912A | 2002-12-04 | |||
| JP2012502501A | 2012-01-26 | |||
| JPH10249737A | 1998-09-22 | |||
| JP2000114211A | 2000-04-21 | |||
| JP2005007520A | 2005-01-13 | |||
| JP2003062754A | 2003-03-05 | |||
| JPH03270883A | 1991-12-03 | |||
| JP2004358584A | 2004-12-24 |
Attorney, Agent or Firm:
FUJIMOTO, Noboru (JP)
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