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Title:
POLISHING SLURRY
Document Type and Number:
WIPO Patent Application WO/2007/020939
Kind Code:
A1
Abstract:
A polishing slurry to be used for polishing conductor or metal is characterized in that the polishing slurry contains water, fullerene or fullerene derivative, and the particle diameter of the fullerene or the fullerene devivative is 100nm or smaller. A planarity of 2nm or less in 20μm square is achieved by having the particle diameter of the fullerene or the fullerene derivative 100nm or less.

Inventors:
MIYOSHI, Takashi (1-1 Yamadaoka, Suita-sh, Osaka 71, 5650871, JP)
三好 隆志 (〒71 大阪府吹田市山田丘1番1号 国立大学法人大阪大学内 Osaka, 5650871, JP)
TAKAYA, Yasuhiro (1-1 Yamadaoka, Suita-sh, Osaka 71, 5650871, JP)
高谷 裕浩 (〒71 大阪府吹田市山田丘1番1号 国立大学法人大阪大学内 Osaka, 5650871, JP)
KOKUBO, Ken (1-1 Yamadaoka, Suita-sh, Osaka 71, 5650871, JP)
Application Number:
JP2006/316096
Publication Date:
February 22, 2007
Filing Date:
August 16, 2006
Export Citation:
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Assignee:
Vitamin C60 BioResearch Corporation (3-1 Marunouchi 2-chome, Chiyoda-ku Tokyo, 86, 1008086, JP)
ビタミンC60バイオリサーチ株式会社 (〒86 東京都千代田区丸の内二丁目3番1号 Tokyo, 1008086, JP)
MIYOSHI, Takashi (1-1 Yamadaoka, Suita-sh, Osaka 71, 5650871, JP)
三好 隆志 (〒71 大阪府吹田市山田丘1番1号 国立大学法人大阪大学内 Osaka, 5650871, JP)
TAKAYA, Yasuhiro (1-1 Yamadaoka, Suita-sh, Osaka 71, 5650871, JP)
高谷 裕浩 (〒71 大阪府吹田市山田丘1番1号 国立大学法人大阪大学内 Osaka, 5650871, JP)
International Classes:
H01L21/304; B24B37/04
Attorney, Agent or Firm:
MORISHITA, Sakaki (2-11-12 Ebisu-Nishi, Shibuya-ku Tokyo, 21, 1500021, JP)
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