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Title:
POLYACETAL RESIN COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2008/001557
Kind Code:
A1
Abstract:
Disclosed is a polyacetal resin composition excellent in workability, stability and weather (light) resistance, which enables to obtain a molded article greatly suppressed in generation of formaldehyde while being prevented from bleeding of the blended components. Specifically disclosed is a polyacetal resin composition wherein a hindered phenol antioxidant (B), at least one compound (C) selected from guanamine compounds (c-1) and hydrazide compounds (c-2), an hindered amine stabilizer (D) wherein nitrogen in a piperidine derivative having a steric hindrance group is tertiary, and an ultraviolet absorbent (E) are blended, in specific amounts at a specific blending ratio, into a polyacetal copolymer (A) which contains hemiformal terminal groups of not more than 1.0 mmol/kg, formyl terminal groups of not more than 2.0 mmol/kg, and unstable terminal groups of not more than 0.5% by weight.

Inventors:
HASE HIROYUKI (JP)
Application Number:
PCT/JP2007/060294
Publication Date:
January 03, 2008
Filing Date:
May 14, 2007
Export Citation:
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Assignee:
POLYPLASTICS CO (JP)
HASE HIROYUKI (JP)
International Classes:
C08L59/04; C08K5/13; C08K5/20; C08K5/24; C08K5/3432; C08K5/3475; C08K5/3477
Domestic Patent References:
WO2005044917A12005-05-19
WO2004058875A12004-07-15
WO2004058875A12004-07-15
Foreign References:
JP2002212384A2002-07-31
JP2000239484A2000-09-05
JP2000044769A2000-02-15
JPH10182928A1998-07-07
JPH11335518A1999-12-07
JP2000026704A2000-01-25
JP2003113289A2003-04-18
JPS62190248A1987-08-20
JP2005112995A2005-04-28
JPS6136339A1986-02-21
JPH06256623A1994-09-13
EP1688461A12006-08-09
JP2002212384A2002-07-31
JP2000239484A2000-09-05
JP2000044769A2000-02-15
JP2001011143A2001-01-16
JPH06179671A1994-06-28
JPH0710871A1995-01-13
JPS4741120B
JPH03284675A1991-12-16
JPH0733766A1995-02-03
JP2000154181A2000-06-06
Other References:
See also references of EP 2036949A4
Attorney, Agent or Firm:
FURUYA, Satoshi et al. (2-17-8 Nihonbashi-Hamach, Chuo-ku Tokyo, JP)
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