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Title:
POLY(AROMATIC VINYL)/POLYISOPRENE BLOCK COPOLYMER COMPOSITION, PROCESS FOR PRODUCING THE SAME, AND PRESSURE-SENSITIVE ADHESIVE COMPOSITION
Document Type and Number:
WIPO Patent Application WO/1999/058604
Kind Code:
A1
Abstract:
A poly(aromatic vinyl)/polyisoprene block copolymer composition comprising: 35 to 50 wt.%, excluding 50 wt.%, diblock polymer represented by the formula A-B [wherein A is a poly(aromatic vinyl) block and B is a polyisoprene block]; 23 to 65 wt.% four-branch polymer represented by the formula (A-B)¿4?X (wherein A and B are the same as the above and X is a residue of a polyfunctional coupling agent) and having a weight-average molecular weight of 250,000 to 500,000; and 0 to 42 wt.% at least one branched polymer selected among two-branch polymers and three-branch polymers represented by general formula (4). This copolymer is produced by contacting an organolithium initiator with an aromatic vinyl monomer to yield a poly(aromatic vinyl) block A, adding isoprene thereto to yield an A-B block copolymer, and then reacting the A-B block copolymer with a coupling agent having a functionality of 4 or higher in the presence of a coupling accelerator to change part of the A-B block copolymer to the above branched polymers. This copolymer is useful in a pressure-sensitive adhesive composition.

Inventors:
KOMATSUZAKI SHIGERU (JP)
MATSUBARA TETSUAKI (JP)
TSUBAKI HIDEMI (JP)
Application Number:
PCT/JP1999/002458
Publication Date:
November 18, 1999
Filing Date:
May 13, 1999
Export Citation:
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Assignee:
NIPPON ZEON CO (JP)
KOMATSUZAKI SHIGERU (JP)
MATSUBARA TETSUAKI (JP)
TSUBAKI HIDEMI (JP)
International Classes:
C08F297/04; C09J153/02; (IPC1-7): C08L53/02; C08F297/04; C09J153/02
Foreign References:
JPH06279744A1994-10-04
JPH10130349A1998-05-19
Attorney, Agent or Firm:
Wada, Yasuro (Ltd. 6-1 Marunouchi 2-chome Chiyoda-ku, Tokyo, JP)
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