Title:
POLYCARBOXYLIC ACID CONDENSATE, THERMOSETTING RESIN COMPOSITION, SUBSTRATE FOR MOUNTING SEMICONDUCTOR ELEMENT AND PROCESS FOR PRODUCING SAME, AND SEMICONDUCTOR DEVICE
Document Type and Number:
WIPO Patent Application WO/2012/015011
Kind Code:
A1
Abstract:
A polycarboxylic acid condensate which is obtained by intermolecular condensation of a carboxyl-containing compound and which contains constituent units derived from a carboxyl-containing compound that exhibits a solubility of 100g/L or less in water at 30°C.
Inventors:
KOTANI Hayato (48, Wadai, Tsukuba-sh, Ibaraki 47, 〒3004247, JP)
小谷 勇人 (〒47 茨城県つくば市和台４８ 日立化成工業株式会社内 Ibaraki, 〒3004247, JP)
URASAKI Naoyuki (48, Wadai, Tsukuba-sh, Ibaraki 47, 〒3004247, JP)
小谷 勇人 (〒47 茨城県つくば市和台４８ 日立化成工業株式会社内 Ibaraki, 〒3004247, JP)
URASAKI Naoyuki (48, Wadai, Tsukuba-sh, Ibaraki 47, 〒3004247, JP)
Application Number:
JP2011/067365
Publication Date:
February 02, 2012
Filing Date:
July 28, 2011
Export Citation:
Assignee:
HITACHI CHEMICAL COMPANY, LTD. (1-1 Nishi-Shinjuku 2-chome, Shinjuku-ku Tokyo, 49, 〒1630449, JP)
日立化成工業株式会社 (〒49 東京都新宿区西新宿二丁目１番１号 Tokyo, 〒1630449, JP)
KOTANI Hayato (48, Wadai, Tsukuba-sh, Ibaraki 47, 〒3004247, JP)
小谷 勇人 (〒47 茨城県つくば市和台４８ 日立化成工業株式会社内 Ibaraki, 〒3004247, JP)
日立化成工業株式会社 (〒49 東京都新宿区西新宿二丁目１番１号 Tokyo, 〒1630449, JP)
KOTANI Hayato (48, Wadai, Tsukuba-sh, Ibaraki 47, 〒3004247, JP)
小谷 勇人 (〒47 茨城県つくば市和台４８ 日立化成工業株式会社内 Ibaraki, 〒3004247, JP)
International Classes:
C08G67/04; C08G59/42; H01L33/60
Attorney, Agent or Firm:
HASEGAWA Yoshiki et al. (SOEI PATENT AND LAW FIRM, Marunouchi MY PLAZA 9th fl. 1-1, Marunouchi 2-chome, Chiyoda-k, Tokyo 05, 〒1000005, JP)
Claims: