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Title:
POLYETHER GROUP-CONTAINING COMPOUND
Document Type and Number:
WIPO Patent Application WO/2023/204249
Kind Code:
A1
Abstract:
Provided is a compound having a novel structure that is usable for surface-treating substrates. A polyether group-containing compound represented by formula (I) [in formula (I): W represents a divalent group having PE; R- independently represents, at each occurrence, RPE- that is a monovalent group having PE or RSi- that is a monovalent group having a reactive silyl group, provided that at least one R- is RSi-; the sum of the numbers of RPE-s and RSi-s is 4; and PE independently represents, at each occurrence, a group represented by formula: -(OC6F12)a-(OC5F10)b-(OC4F8)c-(OC3X10 6)d-(OC2F4)e-(OCF2)f- (in the formula: a, b, c, d, e and f are each independently an integer of 0-200 inclusive; the sum of a, b, c, d, e and f is at least 1; the order of presence of each repeating unit bracketed with a, b, c, d, e or f is arbitrary in the formula; and X10 independently represents, at each occurrence, a hydrogen atom, a fluorine atom or a chlorine atom)].

Inventors:
KUBOTA HIROKI (JP)
YAMASHITA TSUNEO (JP)
OZAWA KAORI (JP)
MITSUHASHI HISASHI (JP)
Application Number:
PCT/JP2023/015630
Publication Date:
October 26, 2023
Filing Date:
April 19, 2023
Export Citation:
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Assignee:
DAIKIN IND LTD (JP)
International Classes:
C08G65/333; C09D5/16; C09K3/18; G02B1/18
Domestic Patent References:
WO2020111138A12020-06-04
Foreign References:
JP7029101B12022-03-03
JP2013506752A2013-02-28
Attorney, Agent or Firm:
YAMAO, Norihito et al. (JP)
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