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Patent Searching and Data


Title:
POLYETHER NITRILE FILM AND METHOD FOR PRODUCING POLYETHER NITRILE FILM
Document Type and Number:
WIPO Patent Application WO/2023/188842
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide a polyether nitrile film which has excellent processability and high heat resistance, and which exhibits excellent stretchability before being stretched, while having high crystallinity after being stretched. In order to achieve the above-described purpose, a polyether nitrile film according to the present invention has the following configuration. The present invention provides a polyether nitrile film which is a molded film formed from a polyether nitrile that contains N repeating units represented by formula (I) and M repeating units represented by formula (II), with N and M being integers that satisfy the relational expression 0.80 ≤ (N/(N + M)) < 1.00; and with respect to this polyether nitrile film, melting enthalpy is observed.

Inventors:
HIRANO TAISUKE (JP)
AKAHIRA MASATO (JP)
YAMAUCHI KOJI (JP)
Application Number:
PCT/JP2023/004095
Publication Date:
October 05, 2023
Filing Date:
February 08, 2023
Export Citation:
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Assignee:
TORAY INDUSTRIES (JP)
International Classes:
C08J5/18; C08G65/40
Domestic Patent References:
WO2021241492A12021-12-02
WO2021117814A12021-06-17
Foreign References:
JPH0864640A1996-03-08
JPH03181519A1991-08-07
JP2001255751A2001-09-21
CN112851996A2021-05-28
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