Title:
POLYIMIDE AND POLYIMIDE FILM COMPRISING THE SAME
Document Type and Number:
WIPO Patent Application WO/2014/003451
Kind Code:
A1
Abstract:
This invention relates to polyimide, which includes amorphous silica particles having OH groups thereon and is thus highly heat-resistant, colorless and transparent, and to a polyimide film manufactured using the polyimide.
Inventors:
JU CHUL HA (KR)
PARK HYO JUN (KR)
JUNG HAK GEE (KR)
PARK HYO JUN (KR)
JUNG HAK GEE (KR)
Application Number:
PCT/KR2013/005685
Publication Date:
January 03, 2014
Filing Date:
June 27, 2013
Export Citation:
Assignee:
KOLON INC (KR)
International Classes:
C08J5/18; C08G73/10; C08K3/36; C08L79/08
Domestic Patent References:
| WO2012050072A1 | 2012-04-19 |
Foreign References:
| US5688841A | 1997-11-18 | |||
| KR20090019306A | 2009-02-25 | |||
| JPH08104749A | 1996-04-23 | |||
| JP2005325329A | 2005-11-24 |
Other References:
ZHURAVLEV, L. T. ET AL.: "Concentration of HydroxyL Groups on the Surface of Amorphous Silicas", LANGMUIR, vol. 3, no. 3, 1987, pages 316 - 318, XP055031739
Attorney, Agent or Firm:
KONG, Min Ho et al. (BYC Building 648-1, Yeoksam-dong,Gangnam-gu, Seoul 135-080, KR)
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