DIELECTRIC CONSTANT AND LOW DIELECTRIC DISSIPATION

This invention relates to a polymer composite comprising fibrous and particulate fillers, particularly a polymer composite comprising fibrous electrically conductive fillers and electrically nonconductive particulate fillers, which is useful in electro-actuation applications. It further relates to a method of incorporating fibrous fillers into a polymeric matrix.

In addition to electro-actuation, there are many other applications where it is desired to increase the dielectric constant of a polymer. Many techniques have been applied for this purpose, including chemical modification of the main chain and side groups, and

incorporation of high dielectric constant fillers. A common drawback of increasing dielectric constant is the concurrent increase in dielectric loss. An increase in dielectric loss can cause higher energy consumption, heat generation during the operation of the devices, signal delay, and increase leakage current. Silicone films have been filled with barium titanate to provide a dielectric film actuator, see for example, Y. Liu et al., Smart Mater. Struct. , 18 (2009) 095024. However, this reference discloses an increase in dielectric loss with increasing amounts of barium titanate.

There is an unsolved problem to fully utilize those approaches to increase the dielectric constant but with innovative techniques to suppress the increase of dielectric loss. Further, the increase in elastic modulus should be minimized.

Statement of the Invention

The present invention provides a composition comprising:

a) electrically conductive fibers comprising carbon, a conductive oxide, or a metal; and having an average diameter from 1 to 20,000 nm and an average length at least five times the average diameter; and

b) electrically nonconductive particles with an average diameter from 1 to 20,000 nm.

The present invention also provides a method comprising:

c) creating a surface electric charge on a fibrous material by physical adsorption chemical oxidation

d) adding a particulate material bearing opposite charge on the surface to form a mixture, and

e) combining the mixture with a polymer. Detailed Description

Percentages are weight percentages (wt%) and temperatures are in °C unless specified otherwise. Operations were performed at room temperature unless specified otherwise. As used herein, unless otherwise indicated, molecular weights, M _n , M _w and M _z have the conventional meanings and are determined by gel permeation chromatography. Molecular weights are reported herein in units of g/mol. Silanol index is determined by FT-IR as described in the Examples.

Preferably, the composition further comprises a polymer matrix, preferably one comprising a polysiloxane. Preferably, the polysiloxane is produced from a curable silicone composition selected from (a) hydrosilylation-curable silicone compositions; (b)

condensation-curable silicone compositions; (c) thiol-ene reaction-curable silicone compositions; (d) free-radical-curable silicone compositions; and (e) ring-opening reaction curable silicone compositions. Each of the foregoing may be cured using means other than those stated or by a combination of means.

A hydrosilylation-curable silicone composition typically comprises: (A) an organopolysiloxane having an average of at least two silicon-bonded alkenyl groups or silicon-bonded hydrogen atoms per molecule; (B) an organosilicon compound having an average of at least two silicon-bonded hydrogen atoms or silicon-bonded alkenyl groups per molecule capable of reacting with the silicon-bonded alkenyl groups or silicon-bonded hydrogen atoms in the organopolysiloxane (A); and (C) a hydrosilylation catalyst. The organopolysiloxane (A) and the organosilicon compound (B) may independently be linear, branched, cyclic, or resinous. In particular, the organopolysiloxane (A) and the organosilicon compound (B) may comprise any combination of M, D, T, and Q units. M represents the monofunctional unit R°3SiOi/2. D represents the difunctional unit R°2Si02/2. T represents the Afunctional unit R°Si03/2. Q represents the tetrafunctional unit S1O4/2. Each R° may be any hydrocarbon, aromatic, aliphatic, alkyl, alkenyl, or alkynyl group. An organopolysiloxane comprising repeating D units is substantially linear but may include some branching attributable to T and/or Q units. When organopolysiloxanes are predominantly linear the resulting structures are elastomeric. In a preferred embodiment, the organopolysiloxane (A) has the general formula:

(R ¹ R ² 2SiOl/2)w(R ² 2Si02/2)x(R ² Si0 ₃ /2) _y (Si0 ₄ /2)z (I)

wherein each R ¹ is an independently selected hydrocarbyl group, which may be substituted or unsubstituted and may include heteroatoms within the hydrocarbyl group (e.g., O, N, S), and each R ² is independently selected from R ¹ and an alkenyl group, with the proviso that at least two of R ² are alkenyl groups, and w, x, y, and z are mole fractions such that w+x+y+z=l. For linear organopolysiloxanes, subscripts y and z are generally 0, whereas for resins, subscripts y and/or z >0. Preferably, the subscript w has a value of from 0 to 0.9, preferably from 0 to 0.6, preferably from 0 to 0.3, preferably from 0 to 0.1, preferably from 0.00001 to 0.001. Preferably, the subscript x has a value of from 0 to 0.99999, preferably from 0 to

0.9999, preferably from 0 to 0.999, preferably from 0 to 0.99, preferably from 0.9 to 0.99999, preferably from 0.9 to 0.9999, preferably from 0.9 to 0.999. The subscript y preferably has a value of from 0 to 0.99, preferably from 0 to 0.45, preferably from 0 to 0.25, preferably from 0.25 to 0.8, preferably from 0.5 to 0.8. The subscript z preferably has a value of from 0 to 0.99, preferably from 0 to 0.85, preferably from 0.85 to 0.95, preferably from 0.6 to 0.85, preferably from 0.4 to 0.65, preferably from 0.2 to 0.5, preferably from 0.1 to 0.45, preferably from 0 to 0.5, preferably from 0 to 0.25, preferably from 0 to 0.15. Preferably, when R ¹ is halogen-substituted, it is 3,3,3-trifluoropropyl, 3-chloropropyl, chlorophenyl, dichlorophenyl, 2,2,2-trifluoroethyl, 2,2,3, 3-tetrafluoropropyl, or 2,2,3, 3,4,4,5, 5-octafluoropentyl. Preferably, R ¹ is a Ci to Cio hydrocarbyl group; preferably alkyl, aryl or aralkyl. Preferably, alkenyl groups represented by R ² , which may be the same or different within the organopolysiloxane (A), have from 2 to 10 carbon atoms, preferably from 2 to 6 carbon atoms, preferably vinyl or allyl, preferably vinyl.

Preferably, at least one of the silicone compositions comprises a condensation-curable silicone composition which comprises (Α') an organopolysiloxane having an average of at least two silicon-bonded hydroxyl or hydrolyzable groups per molecule; optionally (Β') an organosilicon compound having an average of at least two silicon-bonded hydrogen atoms, hydroxyl groups, or hydrolyzable groups per molecule; and (C) a condensation catalyst. Preferably, the condensation catalyst (C) is any condensation catalyst typically used to promote condensation of silicon-bonded hydroxy (silanol) groups to form Si-O-Si linkages, preferably amines; or compounds of titanium, lead, tin, zinc, zirconium, and iron with carboxylic acids, alkyl, and alkoxide groups; preferably tin(II) and tin(IV) compounds such as tin dilaurate, tin dioctoate, dibutyltin dilaurate, dibutyltin diacetate, and tetrabutyl tin; and titanium compounds such as titanium tetrabutoxide.

Preferably, at least one of the silicone compositions comprises a free radical-curable silicone composition which typically comprises (A") an organopolysiloxane having an average of at least two silicon-bonded unsaturated groups and (C") a free radical initiator.

Preferably, at least one of the silicone compositions comprises a ring opening reaction-curable silicone composition which typically comprises (A'") an organopolysiloxane having at least two epoxy-substituted groups, silacyclobutane rings and/or benzocyclobutene rings, and (C") a curing agent.

Preferably, at least one of the silicone compositions comprises a thiol-ene curable silicone composition which comprises: (A"") an organopolysiloxane having an average of at least two silicon-bonded alkenyl groups or silicon-bonded mercapto-alkyl groups per molecule; (B"") an organosilicon compound having an average of at least two silicon- bonded mercapto-alkyl groups or silicon-bonded alkenyl groups per molecule capable of reacting with the silicon-bonded alkenyl groups or silicon-bonded mercapto-alkyl groups in the organopolysiloxane (A" "); (C"") a catalyst; and (D"") an optional organic compound containing two or more mercapto groups. The catalyst (C" ") can be any catalyst suitable for catalyzing a reaction between the organopolysiloxane (A"") and the organosilicon compound (B" ") and/or the organic compound (D' " '). Typically, the catalyst (C" ") is selected from: i) a free radical catalyst; ii) a nucleophilic reagent; and iii) a combination of i) and ii). Suitable free radical catalysts for use as the catalyst (C"") include photo- activated free radical catalysts, heat- activated free radical catalysts, room temperature free radical catalysts such as redox catalysts and alkylborane catalysts, and combinations thereof.

Suitable nucleophilic reagents for use as the catalyst (C"") include amines, phosphines, and combinations thereof.

Preferably, at least one of the silicone compositions comprises a silicon hydride- silanol reaction curable silicone composition which typically comprises: (A' " ") an organopolysiloxane having an average of at least two silicon-bonded hydrogen atoms or at least two silicone bonded hydroxyl groups per molecule; (Β" " ') an organosilicon compound having an average of at least two silicon-bonded hydroxyl groups or at least two silicon bonded hydrogen atoms per molecule capable of reacting with the silicon-bonded hydrogen atoms or silicon-bonded hydroxyl groups in the organopolysiloxane (A" " ' ) ; (C" " ' ) a catalyst; and (D'"") an optional active hydrogen containing compound. Typically, the catalyst (C' " ") is selected from: i) a Group X metal-containing catalyst such as platinum; ii) a base such as metal hydroxide, amine, or phosphine; and iii) combinations thereof.

The polymer matrix is not limited to silicone. Other polymers are suitable also, including thermoplastic polymers such as polyolefins, polyethers, polyketones, polyesters, polyurethanes, polyimides, polyacrylates, and thermoset polymers such as epoxides, cyanate esters, polyimides, polyurethanes, etc.

Preferably, the electrically conductive fibers have a conductivity from 0.1 to lxlO ⁸ Siemens per meter (S/m), preferably from 1 to lxlO ⁸ S/m, preferably from 4 to lxlO ⁸ S/m, preferably from 10 to lxlO ⁸ S/m, preferably from 100 to lxlO ⁸ S/m, preferably from lxlO ³ to lxlO ⁸ S/m. Preferably, the fibers comprise carbon which is surface oxidized.

Preferably, the electrically nonconductive particles have an average diameter of at least 1 nm, preferably at least 5 nm, preferably at least 10 nm; preferably no more than 20,000 nm, preferably no more than 10,000 nm, preferably no more than 1,000 nm. Average diameter is determined as an arithmetic average and can be measured by many techniques, preferably transmission electron microscope followed by image analysis. Preferably, the nanoparticles are electrically non-conductive, i.e., they have an electrical conductivity no greater than 0.1 S/m, preferably no greater than lxlO ² S/m, preferably no greater than lxlO ³ S/m. Preferably, the nanoparticles comprise an inorganic or organic polymeric composition. Inorganic particles include but are not limited to barium titanate and other oxide

compositions of the perovskite structure, titanium dioxide, zirconium dioxide, silicon dioxide, and oxides, borides, nitrides, carbides and silicides of other metals such as hafnium, germanium, tin, lead, aluminum, gallium, indium, niobium, scandium, yttrium, vanadium, and lanthanide and actinide series elements such as erbium, and europium. Organic polymeric particles include but are not limited to polystyrene, polyacrylates,

polyvinylchloride, acrylonitrile-butadiene-styrene terpolymer, polyvinylidene fluoride, Polytetrafluoroethylene, polyvinyl acetate, and various copolymers.

Preferably, the electrically conductive fibers have an average diameter of at least 2 nm, preferably at least 3 nm, preferably at least 5 nm, preferably at least 10 nm; preferably no more than 10,000 nm, preferably no more than 5,000 nm, preferably no more than 1,000 nm, preferably no more than 500 nm, preferably no more than 100 nm, preferably no more than 50 nm. Preferably, the electrically conductive fibers have an average length at least 8 times the diameter, preferably at least 10 times; preferably no more than 1,000,000 times, preferably no more than 100,000 times.

Preferably, the weight ratio of nanoparticles to electrically conductive fibers is from 0.01:50 to 50:1, preferably from 0.1:10 to 10;1, preferably from 0.2:2 to 5:1. Preferably, when the composition comprises a polymer matrix, the total weight of the nanoparticles and the electrically conductive fibers is from 0.1 to 80 wt% of the total weight of polymer matrix, nanoparticles and electrically conductive fibers, preferably at least 0.5 wt%, preferably at least 1 wt%; preferably no more than 80 wt%, preferably no more than 60 wt%.

In the method of this invention, preferably the particles and fibers are combined with a polymer resin which is then cured. Examples

Table 1. Raw materials used, suppliers, and descriptions

Preparation of oxidized carbon nanofiber (CNF).

2.84 g of PYROGRAF III PR-19-XT-PS carbon nanofiber (vapor phase grown, average diameter ca. 150 nm, CVD deposited carbon on surface) was placed in a three necked round bottom flask equipped with a mechanical stirrer, a reflux condenser, and a thermometer. 90 g of 70 wt% HNO3 was diluted with deionized water to a total volume of 250 ml to prepare a 1M HNO3 solution and the solution was added into the flask. With stirring the temperature was raised to 105.1 °C and reflux was maintained for 110 hours. The content was then cooled down, filtered through a #1 filter paper. The cake left on top of the filter paper was washed with DI water eight times. 75% of the cake was dispersed in 20 g DI water to make a stable slurry. The solid content in this slurry was determined to be -10 wt% based on a heat drying measurement. The rest of the cake was dried in a ventilated oven at 95 °C for 20 hours, then 120 °C for 1 hour. Treatment and Dispersion of BaTiCb nanoparticles

10 g of 50 nm BaTiCb dry particles were placed in a 40 ml glass vial, 20 g of DI water was added followed by 0.13 g of 34-37 wt% hydrochloric acid. The mixture was stirred by a magnetic bar at room temperature for 20 hours, then mixed by an IKA T18 Ultra Turrax rotor stator mixer at 20k rpm for 60 seconds. The dispersion was to be used in the next step without further treatment.

Preparation of CNF with BaTi0 ₃ adsorbed onto it (CNF@BaTi0 ₃ )

Half the quantity of the above prepared CNF slurry was taken and 65 g of DI water was added into it. The mixture was shaken to make a stable dispersion. To ensure homogeneous mixing, the mixture was mixed by an IKA T18 Ultra Turrax rotor stator mixer at 20k rpm for 60 seconds. While maintaining stirring by the rotor stator mixer, 10 g of the above prepared BaTi03 dispersion was added. Mixing continued for another 60 seconds, then the content was placed in a glass container and water was removed by placing the container with the top open in a ventilated oven at 95 °C for 20 hours, then 120 °C for 1 hour. 4.5 g of dry material was obtained, and was estimated to consist of 1 part by weight of treated CNF in 2/4 parts by weight of treated BaTiCh.

Preparation of CNF with Silica nanoparticles adsorbed onto it (CNF@Si02)

8.62 g of the above treated CNF slurry was placed in a 40 ml glass vial and mixed with 8 g DI water. The mixture was mixed with an ultrasonic processor, model GEX 130, with a max power of 130 W, and a model CV18 vibration generator, and a 3/8" diameter stainless steel tip, at 90% amplitude for 3 minutes. 5 g of Nalco DVSZN002 colloidal silica was then added and mixed with the same ultrasonic processor and the same process parameters. The resulting dispersion was stable. It was then poured into a petri dish and placed in a ventilated oven to dry: 3 °C/min to 95 °C, 95 °C/8 h, 1 °C/min to 100 °C, 100 °C/1 h, 1 °C/min to 115 °C, 115 °C/2 h. 2.2 g of solid material was obtained. The weight ratio of CNF to silica was estimated to be 1 to 2.32. Preparation of ITO in SYLGARD 184 Silicone Elastomer

Appropriate amount of 100 nm ITO particle (average diameter, ca. 150 nm) dispersion in IPA was mixed with SYLGARD 184 base polymer in a single neck round bottom flask. The amount of the latter was calculated to arrive at the desired ITO/Silicone ratio. The mixture was placed on a rotary evaporator set at 80 °C and continuously decreasing vacuum to remove the IPA. Final pressure was 1 mm Hg. The mixture free of IPA was then cooled, SYLGARD 184 curing catalyst, in the amount of 1/10 of the weight of the starting

SYLGARD 184 base, was added and mixed well for curing. The ITO amount was adjusted for different samples to arrive at the desired total ITO content in the final cured composition.

Preparation of comparison sample disks for dielectric measurement

5 g of Sylgard 184 base and 0.5 g of Sylgard 184 curing catalyst were mixed in a 10 g capacity cup on a FlackTek mixer at 3500 rpm for 2 minutes. 2 g of the mixture is placed in a 2 inch diameter opening of a 0.8 mm thick spacer cut out from an aluminum plate lined by a Teflon sheet on a polished stainless steel plate (6"X6") underneath. An additional Teflon sheet is placed on the top and then covered by another polished stainless steel plate. The assembly is placed in a heated press at a temperature of 130 °C and under a force of 4000 lb. The assembly is kept under this condition for 30 minutes and then cooled with chilled water flowing through the press platens. The cured 2 inch diameter, 0.8 mm thick disks are collected and used for dielectric tests. The thickness of the spacer was changed to obtain samples of different thickness for testing.

Preparation of comparison sample disks containing ITO particles for dielectric measurement The ITO containing Sylgard 184 base and catalyst mixture was used to make disks, following the same procedure described above.

Preparation of comparison sample disks containing Ag nanoparticles for dielectric measurement

An appropriate amount of 18 nm average diameter dry Ag nano particles was placed in a 10 g capacity dental mixer cup, then 5 g of Sylgard 184 base was weighed in. 10 3 mm diameter corrosion resistant stainless steel bearing balls are placed in the cup and the mixture was mixed on a FlackTec mixer at 3500 rpm for 2 minutes (1 minutes, wait for 5 minutes, then 1 minute, to minimize heating up). After cooling for 10 minutes, 0.5 g of Sylgard 184 curing agent was weighed in and mixed at 3500 rpm for 30 seconds. 2 g of the mixture was taken to make disks for dielectric measurement, following the same disk making procedures described above. The amount of Ag nanoparticles was adjusted to arrive at the desired Ag content in the disks.

Preparation of comparison sample disks containing carbon nanofiber for dielectric measurement

The same procedure was used to prepare untreated Pyrograf III CNF containing disks as above, only using the untreated Pyrograf III CNF instead of Ag nanoparticles.

Preparation of Example disks containing MWCNT-T1O2 for dielectric measurement The same procedure was used to prepare MWCNT (multi- walled carbon nanotube, inside diameter 5-15 nm, outside diameter >50 nm, length 5-20 microns) -T1O2 containing disks as above, only using the MWCNT-T1O2 instead of Ag nanoparticles or untreated Pyrograf III CNF.

Preparation of Example disks containing CNF@BaTi03 for dielectric measurement

The same procedure was used to prepare CNF@BaTi03 containing disks as above, only using the above prepared CNF@BaTi03, instead of MWCNT- T1O2, Ag nanoparticles, or untreated Pyrograf III CNF.

Preparation of Example disks containing CNF@Si02 for dielectric measurement

The same procedure was used to prepare CNF@Si02 containing disks as above, only using the above prepared CNF@Si02, instead of MWCNT-T1O2, Ag nanoparticles, or untreated Pyrograf III CNF.

Table 2. Sample compositions and Dielectric Test Results.

Sylgard 184 0.8 mm 0.828 0.9150 100 Hz 2.78 0.0016 1 % Ag 18 nm round 0.828 0.9150 100 kHz 2.80 0.0013 particles

Comparison Sample 0.828 0.9150 1 MHz 2.79 0.0017

Sylgard 184 0.8 mm 0.814 0.9150 100 Hz 2.91 0.0048 2 % Ag 18 nm round 0.814 0.9150 100 kHz 2.93 0.0014 particles

Comparison Sample 0.814 0.9150 1 MHz 2.92 0.0019

Sylgard 184 0.8 mm 0.816 0.8950 100 Hz 2.85 0.0026.4 % Ag 18 nm round 0.816 0.8950 100 kHz 2.87 0.0014 particles

Comparison Sample 0.816 0.8950 1 MHz 2.86 0.0020

Sylgard 184 0.8 mm 0.822 0.9050 100 Hz 2.83 0.0026.8 % Ag 18 nm round 0.822 0.9050 100 kHz 2.84 0.0014 particles

Comparison Sample 0.822 0.9050 1 MHz 2.83 0.0019

Sylgard 184 0.8 mm 0.826 0.9050 100 Hz 2.88 0.0049.8 % Ag 18 nm round 0.826 0.9050 100 kHz 2.84 0.0016 particles

Comparison Sample 0.826 0.9050 1 MHz 2.83 0.0021

Sylgard 184 0.8 mm 0.824 0.9050 100 Hz 2.90 0.0035 5 % Ag 18 nm round 0.824 0.9050 100 kHz 2.90 0.0018 particles

Comparison Sample 0.824 0.9050 1 MHz 2.89 0.0024

Sylgard 184 0.8 mm 0.816 0.9000 100 Hz 3.28 0.0016

1 % Pyrograf III 0.816 0.9000 100 kHz 3.25 0.0015 Comparison Sample

0.816 0.9000 1 MHz 3.24 0.0023

Sylgard 184 0.8 mm 0.818 0.9000 100 Hz 10.10 0.0675 1.78 % Pyrograf III 0.818 0.9000 100 kHz 7.43 0.0747 Comparison Sample 0.818 0.9000 1 MHz 6.51 0.1059

0.836 0.9200 100 Hz 3.42 0.0020

Sylgard 184 0.8 mm 0.836 0.9200 100 kHz 3.40 0.0015 1% CNT 4% T1O2 0.836 0.9200 1 MHz 3.39 0.0019

Sylgard 184 0.8 mm 0.842 0.9250 100 Hz 4.52 0.0031 2% CNT 8% T1O2 0.842 0.9250 100 kHz 4.49 0.0019

0.842 0.9250 1 MHz 4.47 0.0023

Sylgard 184 0.8 mm 0.830 0.9100 100 Hz 6.02 0.0047 3% CNT 12% T1O2 0.830 0.9100 100 kHz 5.88 0.0032 0.830 0.9100 1 MHz 5.85 0.0044

Sylgard 184 0.8 mm 0.826 0.9050 100 Hz 6.22 0.0044.9% CNT ~16% Ti0 ₂ 0.826 0.9050 100 kHz 6.06 0.0035

0.826 0.9050 1 MHz 6.05 0.0044

Sylgard 184 0.8 mm 0.838 0.9200 100 Hz 7.74 0.00675% CNT -17.8% T1O2 0.838 0.9200 100 kHz 7.48 0.0060

0.838 0.9200 1 MHz 7.41 0.0078

Sylgard 184 0.8 mm 0.836 0.9200 100 Hz 8.44 0.0080 5% CNT -20% T1O2 0.836 0.9200 100 kHz 8.10 0.0080

0.836 0.9200 1 MHz 8.00 0.0106

Sylgard 184 0.8 mm 0.844 0.9250 100 Hz 9.16 0.0085 6% CNT -24% T1O2 0.844 0.9250 100 kHz 8.78 0.0087

0.844 0.9250 1 MHz 8.66 0.0112

Sylgard 184 0.8 mm 0.842 0.9250 100 Hz 10.22 0.0109 7% CNT -28% Ti0 ₂ 0.842 0.9250 100 kHz 9.68 0.0122

0.842 0.9250 1 MHz 9.50 0.0158

Sylgard 184 0.8 mm 0.838 0.9200 100 Hz 7.74 0.00675% CNT -17.8% Ti0 ₂ 0.838 0.9200 100 kHz 7.48 0.0060

0.838 0.9200 1 MHz 7.41 0.0078

0.971 1.0700 100 Hz 2.74 0.0028

Sylgard 184 1 mm 0.971 1.0700 100 kHz 2.73 0.0014 Baseline Sample 0.971 1.0700 1 MHz 2.73 0.0014

Sylgard 184 0.8 mm 0.816 0.9000 100 Hz 3.28 0.0016

1 % Pyrograf III 0.816 0.9000 100 kHz 3.25 0.0015 Comparison Sample

0.816 0.9000 1 MHz 3.24 0.0023

Sylgard 184 0.8 mm 0.818 0.9000 100 Hz 10.10 0.0675 1.78 % Pyrograf III 0.818 0.9000 100 kHz 7.43 0.0747 Comparison Sample

0.818 0.9000 1 MHz 6.51 0.1059

Sylgard 184 0.8 mm 0.824 0.9000 100 Hz 5.40 0.0124 5.5 % Oxidized Pyrograf 0.824 0.9000 100 kHz 5.06 0.0075 m/13.3% BaTiOs 0.824 0.9000 1 MHz 5.01 0.0076

0.872 0.9250 100 Hz 4.80 0.0214

0.872 0.9250 100 kHz 4.62 0.0078

Sylgard 184 0.8 mm 0.872 0.9250 1 MHz 4.56 0.0100 5.7 % Oxidized Pyrograf III 0.872 0.9250 5 MHz 4.51 0.0134 /13.2% Colloidal Silica 0.872 0.9250 20 MHz 4.55 0.0151

0.880 0.9250 100 Hz 5.35 0.0113

Sylgard 184 0.8 mm

0.880 0.9250 100 kHz 5.26 0.0029 3.8 % Un-oxidized Pyrograf

III 0.880 0.9250 1 MHz 5.23 0.0050

/15.1% Colloidal Silica 0.880 0.9250 5 MHz 5.21 0.0085

0.880 0.9250 20 MHz 5.29 0.0154

In this invention, it is surprisingly discovered that nanoparticles nonconductive in nature, when adsorbed onto the surface of the conductive fibers, can very effectively mitigate the tendency of the composite to become conductive. Furthermore, this approach can allow for a surprisingly high amount of conductive fiber to be incorporated to increase dielectric constant effectively, while still maintaining low dielectric loss.

More broadly, there has been a long standing problem in attempts to make use of the increasingly available nanofibers of a variety of compositions, but a common challenge is in dispersing them uniformly into a polymer matrix, as common nanofiber production techniques result in tightly bundled fibers. It is surprisingly discovered that this inventive method allow for easy dispersion of tightly buddle nanofibers into polymer matrix uniformly.