Title:
A POLYMER, COMPOSITION, FORMING SACRIFICIAL LAYER AND METHOD FOR SEMICONDUCTOR DEVICE THEREWITH
Document Type and Number:
WIPO Patent Application WO/2017/137142
Kind Code:
A8
Abstract:
The present invention relates to a polymer, composition, the forming of a sacrificial layer and a method for producing a semiconductor device comprising a step during which a pattern is made using a photoresist by the photolithography method.
Inventors:
NAKASUGI SHIGEMASA (JP)
HAMA YUSUKE (JP)
KUROSAWA KAZUNORI (JP)
YANAGITA HIROSHI (JP)
NOYA GO (JP)
HAMA YUSUKE (JP)
KUROSAWA KAZUNORI (JP)
YANAGITA HIROSHI (JP)
NOYA GO (JP)
Application Number:
PCT/EP2017/000058
Publication Date:
September 13, 2018
Filing Date:
January 19, 2017
Export Citation:
Assignee:
AZ ELECTRONIC MAT LUXEMBOURG SARL (LU)
International Classes:
C08G61/02; C08G8/02; C08G10/00; C08G61/12; C09D161/00; C09D165/00; G03F7/09; G03F7/11; G03F7/26; H01L21/027
Attorney, Agent or Firm:
BRAZEL, Christian (DE)
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