POLYMER COMPOSITION AND SINGLE-LAYER RETARDATION MATERIAL

Title:

POLYMER COMPOSITION AND SINGLE-LAYER RETARDATION MATERIAL

Document Type and Number:

WIPO Patent Application WO/2024/071364

Kind Code:

A1

Abstract:

Provided is a polymer composition from which a retardation film reduced in turbidity can be produced by a simpler process. The polymer composition comprises: (A) a block copolymer comprising a photosensitive side-chain-type polymer block (A1) capable of exhibiting liquid crystallinity and a polymer block (A2) made up of repeating units containing neither a photo-aligning side chain nor a liquid-crystalline side chain; and (B) an organic solvent.

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Inventors:

TAMAI YUKI (JP)
NEGI TAKAYUKI (JP)

Application Number:

PCT/JP2023/035570

Publication Date:

April 04, 2024

Filing Date:

September 29, 2023

Export Citation:

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Assignee:

NISSAN CHEMICAL CORP (JP)

International Classes:

C08L53/00; C08F220/30; C08K5/00; C08L33/06; G02B5/30

Domestic Patent References:

WO2023008488A1

2023-02-02

Foreign References:

JP2004124088A	2004-04-22
JP2003535196A	2003-11-25
JP2015000896A	2015-01-05
CN111499817A	2020-08-07

Attorney, Agent or Firm:

PATENT ATTORNEY CORPORATION EI-MEI PATENT OFFICE (JP)

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