Title:
POLYMER COMPOUND, PHOTORESIST COMPOSITION CONTAINING SUCH POLYMER COMPOUND, AND METHOD FOR FORMING RESIST PATTERN
Document Type and Number:
WIPO Patent Application WO/2005/100412
Kind Code:
A1
Abstract:
Disclosed is a polymer compound whose alkali solubility after exposure is significantly changed from one before exposure in a chemically amplified positive resist system. Also disclosed are a photoresist composition containing such a polymer compound and a method for forming a resist pattern which enable to form a fine pattern with high-resolution. The polymer compound contains, as an alkali-soluble group (i), a substituent which is selected from alcoholic hydroxyl groups, carboxyl groups and phenolic hydroxyl groups and protected with an acid-cleavable dissolution inhibiting group (ii) represented by the following general formula (1). (In the formula, A represents an organic group having 1-20 carbon atoms and a valence of not less than n + 1, while n represents an integer of 1-4.)
Inventors:
OGATA TOSHIYUKI (JP)
MATSUMARU SYOGO (JP)
HADA HIDEO (JP)
YOSHIDA MASAAKI (JP)
MATSUMARU SYOGO (JP)
HADA HIDEO (JP)
YOSHIDA MASAAKI (JP)
Application Number:
PCT/JP2005/006657
Publication Date:
October 27, 2005
Filing Date:
April 05, 2005
Export Citation:
Assignee:
TOKYO OHKA KOGYO CO LTD (JP)
OGATA TOSHIYUKI (JP)
MATSUMARU SYOGO (JP)
HADA HIDEO (JP)
YOSHIDA MASAAKI (JP)
OGATA TOSHIYUKI (JP)
MATSUMARU SYOGO (JP)
HADA HIDEO (JP)
YOSHIDA MASAAKI (JP)
International Classes:
C07C69/54; C08F8/00; C08F20/20; C08F220/28; C08F232/08; G03F7/039; C08F222/10; G03F7/004; (IPC1-7): C08F8/00; C07C69/54; C08F20/20; G03F7/039
Foreign References:
| JP2002244299A | 2002-08-30 | |||
| JPH08305025A | 1996-11-22 | |||
| JPH1031310A | 1998-02-03 | |||
| JP2002062656A | 2002-02-28 | |||
| JP2002169292A | 2002-06-14 | |||
| JP2003233177A | 2003-08-22 | |||
| JPS595241A | 1984-01-12 | |||
| JPH02289607A | 1990-11-29 | |||
| US6114462A | 2000-09-05 | |||
| JP2002244299A | 2002-08-30 |
Other References:
See also references of EP 1736485A4
F. HOULIHAN; A. ROMANO; D. RENTKIEWICZ; R. SAKAMURI; R.R. DAMMEL; W. CONLEY; G. RICH; D. MILLER; L. RHODES; J. MCDANIELS, J. PHOTOPOLYM. SCI. TECHNOL., vol. 16, 2003, pages 581
Y. KAWAGUCHI; J. IRIE; S. KODAMA; S. OKADA; Y. TAKABE; 1. KANEKO; O. YOKOKOJI; S. ISHIKAWA; S. IRIE; T. HAGIWARA, PROC. SPIE, vol. 5039, 2003, pages 43
F. HOULIHAN; A. ROMANO; D. RENTKIEWICZ; R. SAKAMURI; R.R. DAMMEL; W. CONLEY; G. RICH; D. MILLER; L. RHODES; J. MCDANIELS, J. PHOTOPOLYM. SCI. TECHNOL., vol. 16, 2003, pages 581
Y. KAWAGUCHI; J. IRIE; S. KODAMA; S. OKADA; Y. TAKABE; 1. KANEKO; O. YOKOKOJI; S. ISHIKAWA; S. IRIE; T. HAGIWARA, PROC. SPIE, vol. 5039, 2003, pages 43
Attorney, Agent or Firm:
Tanai, Sumio (Yaesu Chuo-ku, Tokyo 53, JP)
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