Title:
POLYMER COMPOUND, AND RESIST-PROTECTING FILM COMPOSITION INCLUDING SAME FOR A LIQUID IMMERSION EXPOSURE PROCESS
Document Type and Number:
WIPO Patent Application WO/2012/067349
Kind Code:
A3
Abstract:
Provided are a polymer compound, and a resist-protecting film composition including same for a liquid immersion exposure process.
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Inventors:
HAN MAN HO (KR)
PARK JONG KYOUNG (KR)
KIM HYUN JIN (KR)
KIM JAE HYUN (KR)
PARK JONG KYOUNG (KR)
KIM HYUN JIN (KR)
KIM JAE HYUN (KR)
Application Number:
PCT/KR2011/007655
Publication Date:
July 19, 2012
Filing Date:
October 14, 2011
Export Citation:
Assignee:
DONGJIN SEMICHEM CO LTD (KR)
HAN MAN HO (KR)
PARK JONG KYOUNG (KR)
KIM HYUN JIN (KR)
KIM JAE HYUN (KR)
HAN MAN HO (KR)
PARK JONG KYOUNG (KR)
KIM HYUN JIN (KR)
KIM JAE HYUN (KR)
International Classes:
C08F20/10; C08F12/14; C08F22/06; C08L33/04; G03F7/027
Foreign References:
| JP2000109525A | 2000-04-18 | |||
| KR20060046439A | 2006-05-17 | |||
| US7288362B2 | 2007-10-30 | |||
| KR20090088329A | 2009-08-19 | |||
| KR20100048896A | 2010-05-11 |
Attorney, Agent or Firm:
Y.P.LEE, MOCK & PARTNERS (Seocho-dong Seocho-gu, Seoul 137-875, KR)
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Claims:
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