Title:
POLYMER FUNCTIONAL FILM AND METHOD FOR PRODUCING SAME
Document Type and Number:
WIPO Patent Application WO/2015/030072
Kind Code:
A1
Abstract:
A polymer functional film which is obtained by photocuring a composition that contains a styrene monomer represented by general formula (HSM), a styrene crosslinking agent and a photoacid generator; and a method for producing the polymer functional film.
In general formula (HSM), R represents a halogen atom or -N+(R1)(R2)(R3)(X1
-); n represents an integer of 1-10; each of R1-R3 represents an alkyl group or an aryl group; R1 and R2, or R1, R2 and R3 may combine together to form an aliphatic heterocyclic ring; and X1
- represents an organic or inorganic anion.)
Inventors:
KODAMA KEISUKE (JP)
INOUE KAZUOMI (JP)
INOUE KAZUOMI (JP)
Application Number:
PCT/JP2014/072474
Publication Date:
March 05, 2015
Filing Date:
August 27, 2014
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
B01D71/28; B01D61/00; B01D61/02; B01D69/10; B01D69/12; B01D71/26; C08F212/14; C08J5/22; H01M8/02; H01M8/10
Foreign References:
| JPH04298223A | 1992-10-22 | |||
| JP2011110474A | 2011-06-09 | |||
| JP2000117077A | 2000-04-25 |
Attorney, Agent or Firm:
IIDA, Toshizo et al. (JP)
Toshizo Iida (JP)
Toshizo Iida (JP)
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