Title:
POLYMER AND METHOD FOR PRODUCING SAME, PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, AND MONOMER COMPOUND AND METHOD FOR PRODUCING SAME
Document Type and Number:
WIPO Patent Application WO/2023/248976
Kind Code:
A1
Abstract:
The present invention provides: a polymer that has excellent storage stability and can yield a cured product having excellent solvent resistance even under low-temperature curing conditions; a photosensitive resin composition that contains the polymer; and a cured product of the photosensitive resin composition. The present invention is a polymer characterized by having a structural unit (A) represented by formula (1) (in the formula, X represents a hydrogen atom or a methyl group. L represents a linear or branched divalent organic group. Y represents an organic group that is decomposed by acid or heat and generates a vinyl ether group in a polymer side chain.).
Inventors:
TERADA TAKUMA (JP)
MATSUURA HIROKI (JP)
YUSA SHINICHI (JP)
MATSUURA HIROKI (JP)
YUSA SHINICHI (JP)
Application Number:
PCT/JP2023/022596
Publication Date:
December 28, 2023
Filing Date:
June 19, 2023
Export Citation:
Assignee:
NIPPON CATALYTIC CHEM IND (JP)
International Classes:
C08F20/26; C07C67/04; C07C67/343; C07C69/54; C08F20/28; C08F265/06; C08F290/12; C08L33/00; G02B5/20; G03F7/004; G03F7/033; G03F7/038
Foreign References:
| JP2008088368A | 2008-04-17 | |||
| JPH06306251A | 1994-11-01 | |||
| JP2016210926A | 2016-12-15 | |||
| JP2019210453A | 2019-12-12 |
Attorney, Agent or Firm:
WISEPLUS IP FIRM (JP)
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