Title:
POLYMER, POSITIVE RESIST COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN
Document Type and Number:
WIPO Patent Application WO/2019/181582
Kind Code:
A1
Abstract:
This polymer includes a monomer unit (A) represented by formula (I) and a monomer unit (B) represented by formula (II), and has a weight average molecular weight of 30,000 or greater. In formula (I), B is an optionally substituted bridge ring saturated hydrocarbon ring group, where n is 0 or 1. In formula (II), R1 is an alkyl group, p is an integer of 0-5, and when there are more than one R1, they may be the same or different from each other.
Inventors:
TSUTSUMI TAKASHI (JP)
Application Number:
PCT/JP2019/009504
Publication Date:
September 26, 2019
Filing Date:
March 08, 2019
Export Citation:
Assignee:
ZEON CORP (JP)
International Classes:
C08F220/12; C08F212/06; G03F7/039; G03F7/20
Domestic Patent References:
| WO2018168370A1 | 2018-09-20 | |||
| WO2018168371A1 | 2018-09-20 |
Foreign References:
| JP2001201854A | 2001-07-27 | |||
| JP2002040661A | 2002-02-06 | |||
| JP2016012104A | 2016-01-21 | |||
| JP2007058159A | 2007-03-08 |
Attorney, Agent or Firm:
SUGIMURA Kenji (JP)
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