POLYMER AND POSITIVE RESIST COMPOSITION

WIPO Patent Application WO/2016/132724

A1

The purpose of the present invention is to provide a polymer which can satisfactorily be used as a positive resist with high sensitivity, and a positive resist composition which can satisfactorily form a resist film with excellent sensitivity. This polymer contains α-methylstyrene units and α-chloro-methyl acrylate units, and the proportion of components that have a molecular weight of more than 80000 is 6.0% or less. Further, this positive resist composition contains said polymer and a solvent.

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HOSHINO MANABU (JP)

PCT/JP2016/000769

August 25, 2016

February 15, 2016

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ZEON CORP (JP)

C08F212/06; C08F220/22; G03F7/039; G03F7/20

JPS63137227A	1988-06-09
JPH03132760A	1991-06-06

KATSUYA OKUBO ET AL.: "Cho Bisai Kako-yo Denshisen Polymer Resist no Kaihatsu to Hyoka", POLYMER MATERIAL FORUM KOEN YOKOSHU, vol. 21, 2012, pages 38
M. OTANI ET AL.: "Improvement of polymer type EB resist sensitivity and line edge roughness", PROCEEDINGS OF SPIE, vol. 8081, 2011, pages 808107/1 - 808107/8
T. YAMAGUCHI ET AL.: "Influence of molecular weight of resist polymers on surface roughness and line-edge roughness", J. VAC. SCI. TECHNOL. B, vol. 22, no. 6, 2004, pages 2604 - 2610, XP012074677, DOI: doi:10.1116/1.1805546

SUGIMURA, KENJI (JP)
Kenji Sugimura (JP)

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